Recherche
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Formation and Self-Organization Kinetics of alpha-CD/PEO-Based Pseudo-Polyrotaxanes in Water. A Specific Behavior at 30 degrees C
(Langmuir. vol. 25, n° 15, pp. 8723-8734, 2009)Article de revue -
Study of mechanisms involved in photoresist microlens formation
(Microelectronic Engineering. vol. 83, n° 4-9, pp. 1087-1090, 2006)Article de revue -
Impact of molecular structure of polymer in 193 nm resist performance
(Microelectronic Engineering. vol. 86, n° 4-6, pp. 796-799, 2009)Article de revue -
Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
(Advanced Materials. vol. 21, n° 10-11, pp. 1121-1125, 2009)Article de revue