Listar Laboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629 por autor "PAIN, L."
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Pattern density multiplication by direct self assembly of block copolymers: Towards 300mm CMOS requirements
TIRON, Raluca; CHEVALIER, Xavier; GAUGIRAN, Stéphanie ...(SPIE Proceedings Series. vol. 8323, pp. 83230O, 2012)Article de revue -
Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning
NAVARRO, C.; NICOLET, C.; ARIURA, F. ...(34th International Conference of Photopolymer Science and Technology, JP, chiba)Communication dans un congrès avec actes -
Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning
NAVARRO, C.; NICOLET, C.; ARIURA, F. ...(Journal of Photopolymer Science and Technology. vol. 30, pp. 69-75, 2017)Article de revue