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hal.structure.identifierInstitut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
dc.contributor.authorDUPIN, Jean-Charles
hal.structure.identifierInstitut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
dc.contributor.authorGONBEAU, Danielle
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMARTIN-LITAS, Isabelle
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorVINATIER, Philippe
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLEVASSEUR, Alain
dc.date.issued2001
dc.identifier.issn0169-4332
dc.description.abstractEnThe present paper reports the XPS study of different amorphous oxysulfides thin films MOySz (M = W, Ti, Mo), prepared by radio frequency magnetron sputtering. It has been shown the coexistence of various environments and formal oxidation numbers for metal atoms. In addition, the observation of several types of sulfur ions has revealed the specific character of such amorphous layers. In order to precise the common features and the differences as a function of the nature of the metal atom, a comparison of the data for the three kinds of thin films has been done.
dc.language.isoen
dc.publisherElsevier
dc.title.enAmorphous oxysulfide thin films MOySz (M = W, Mo, Ti) XPS characterization: Structural and electronic pecularities
dc.typeArticle de revue
dc.identifier.doi10.1016/S0169-4332(00)00893-X
dc.subject.halChimie/Matériaux
dc.subject.halChimie/Chimie inorganique
bordeaux.journalApplied Surface Science
bordeaux.page140-150
bordeaux.volume173
bordeaux.issue1-2
bordeaux.peerReviewedoui
hal.identifierhal-01636424
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01636424v1
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