Afficher la notice abrégée

Nano-proximity direct ion beam writing

hal.structure.identifierCentre for Micro-Photonics [Hawthorn]
hal.structure.identifierMelbourne Centre for Nanofabrication [MCN]
dc.contributor.authorSENIUTINAS, Gediminas
hal.structure.identifierCentre for Micro-Photonics [Hawthorn]
hal.structure.identifierMelbourne Centre for Nanofabrication [MCN]
dc.contributor.authorGERVINSKAS, Gediminas
hal.structure.identifierInstituto de Microelectronica de Madrid [IMM]
dc.contributor.authorANGUITA, Jose
hal.structure.identifierCentre for Micro-Photonics [Hawthorn]
hal.structure.identifierMelbourne Centre for Nanofabrication [MCN]
hal.structure.identifierLaboratoire Ondes et Matière d'Aquitaine [LOMA]
dc.contributor.authorHAKOBYAN, Davit
hal.structure.identifierLaboratoire Ondes et Matière d'Aquitaine [LOMA]
dc.contributor.authorBRASSELET, Etienne
hal.structure.identifierCentre for Micro-Photonics [Hawthorn]
hal.structure.identifierMelbourne Centre for Nanofabrication [MCN]
dc.contributor.authorJUODKAZIS, Saulius
dc.date.created2015-09-02
dc.date.issued2015
dc.identifier.issn2299-680X
dc.description.abstractEnFocused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfaces and micro-optical elements capable to create structured light fields. Surface density of fabricated nano-features, their edge steepness as well as ion implantation extension around the cut line depend on the ion beam intensity profile. The FIB beam intensity cross section was evaluated using atomic force microscopy (AFM) scans of milled line arrays on a thin Pt film. Approximation of two Gaussian intensity distributions describes the actual beam profile composed of central high intensity part and peripheral wings. FIB fabrication reaching aspect ratio of 10 in gold film is demonstrated.
dc.description.sponsorshipInitiative d'excellence de l'Université de Bordeaux
dc.language.isoen
dc.publisherDe Gruyter
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/
dc.subject.enGa ion beam milling
dc.subject.enNanofabrication
dc.subject.enstructured light
dc.title.enNano-proximity direct ion beam writing
dc.typeArticle de revue
dc.identifier.doi10.1515/nanofab-2015-0006
dc.subject.halSciences de l'ingénieur [physics]/Optique / photonique
dc.subject.halSciences de l'ingénieur [physics]/Micro et nanotechnologies/Microélectronique
bordeaux.journalNanofabrication
bordeaux.page54-62
bordeaux.volume2
bordeaux.issue1
bordeaux.peerReviewedoui
hal.identifierhal-01407042
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01407042v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Nanofabrication&rft.date=2015&rft.volume=2&rft.issue=1&rft.spage=54-62&rft.epage=54-62&rft.eissn=2299-680X&rft.issn=2299-680X&rft.au=SENIUTINAS,%20Gediminas&GERVINSKAS,%20Gediminas&ANGUITA,%20Jose&HAKOBYAN,%20Davit&BRASSELET,%20Etienne&rft.genre=article


Fichier(s) constituant ce document

FichiersTailleFormatVue

Il n'y a pas de fichiers associés à ce document.

Ce document figure dans la(les) collection(s) suivante(s)

Afficher la notice abrégée