Photoactivity enhancement of WS2 sputtered thin films by use of nickel
GONBEAU, Danielle
Institut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
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Institut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
Langue
en
Article de revue
Ce document a été publié dans
Thin Solid Films. 1997, vol. 299, n° 1-2, p. 45-52
Elsevier
Résumé en anglais
Photoactive thin films of WS2 have been prepared by radio frequency magnetron sputtering. Physico-chemical properties of the films are mainly investigated by Rutherford backscattering and X-ray diffraction. Optical and ...Lire la suite >
Photoactive thin films of WS2 have been prepared by radio frequency magnetron sputtering. Physico-chemical properties of the films are mainly investigated by Rutherford backscattering and X-ray diffraction. Optical and transport properties are also studied. Films sputtered at a high substrate temperature are made of small bidimensional grains (2H–WS2) surrounded by amorphous boundaries. The photoactivity of these films is weak because of the electron trapping at boundaries. Films sputtered at a low substrate temperature are amorphous and then annealed to produce bidimensional films. It is shown that annealed Ni-coated films give highly textured samples. A nickel–sulphur phase is assumed to act as a surfactant. The strong photoactivity enhancement of these films is attributed to an increase in the grain size.< Réduire
Mots clés en anglais
Sputtering nickel
Rutherford backscattering spectroscopy
X-ray diffraction
Origine
Importé de halUnités de recherche