SASIKALA, Suchithra Padmajan; HUANG, Kai; GIROIRE, Baptiste; PRABHAKARAN, Prem; HENRY, Lucile; PÉNICAUD, Alain; POULIN, Philippe; AYMONIER, Cyril

doi:10.1021/acsami.6b10570

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SASIKALA, Suchithra Padmajan
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]

HUANG, Kai
Centre de recherches Paul Pascal [CRPP]

GIROIRE, Baptiste
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]

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Article de revue

Ce document a été publié dans

ACS Applied Materials & Interfaces. 2016, vol. 8, n° 45, p. 30964–30971

Washington, D.C. : American Chemical Society

Résumé en anglais

We report the exfoliation of graphite and simultaneous N doping of graphene by two methods: supercritical ammonia treatment and liquid-phase exfoliation with NH4OH. While the supercritical ammonia allowed N doping at a level of 6.4 atom % in 2 h, the liquid-phase exfoliation with NH4OH allowed N doping at a level of 2.7 atom % in 6 h. The N doped graphene obtained via the supercritical ammonia route had few layers (<5) and showed large lateral flake size (∼8 μm) and low defect density (ID/IG < 0.6) in spite of their high level of N doping. This work is the first demonstration of supercritical ammonia as an exfoliation agent and N doping precursor for graphene. Notably, the N doped graphene showed electrocatalytic activity toward oxygen reduction reaction with high durability and good methanol tolerance compared to those of commercial Pt/C catalyst.< Réduire

Mots clés en anglais

electrochemical catalyst

in situ N doping of graphene

liquid-phase exfoliation

oxygen reduction reaction

supercritical ammonia

DOI

http://dx.doi.org/10.1021/acsami.6b10570

Project ANR

Initiative d'excellence de l'Université de Bordeaux - ANR-10-IDEX-0003

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Importé de hal

Unités de recherche

Institut de Chimie de la Matière Condensée de Bordeaux (ICMCB) - UMR 5026