Large (GeTe)(Sb2Te3) ratio phase change memory thin films
Langue
en
Communication dans un congrès
Ce document a été publié dans
Conference on Fiber Lasers and Glass Photonics - Materials through Applications, Conference on Fiber Lasers and Glass Photonics - Materials through Applications, 2018-04-22, Strasbourg. 2018
SPIE-INT SOC OPTICAL ENGINEERING
Résumé en anglais
Phase change memory thin films from Ge-Sb-Te system with large (GeTe)(Sb2Te3) ratio have been deposited via UV pulsed laser deposition technique. The studied compositions were Ge6Sb2Te9, Ge8Sb2Te11, Ge10Sb2Te13, and ...Lire la suite >
Phase change memory thin films from Ge-Sb-Te system with large (GeTe)(Sb2Te3) ratio have been deposited via UV pulsed laser deposition technique. The studied compositions were Ge6Sb2Te9, Ge8Sb2Te11, Ge10Sb2Te13, and Ge12Sb2Te15. Physico-chemical properties of the Ge-Sb-Te thin films, based on the scanning electron microscopy with energy-dispersive X-ray analysis, X-ray diffraction and reflectometry, atomic force microscopy, optical reflectivity, sheet resistance temperature dependences, and variable angle spectroscopic ellipsometry measurements, were studied in order to assess the effect of chemical composition of the deposited layers. All the obtained data confirm the importance of GeTe content in (GeTe)(1-x)(Sb2Te3)(x) thin films.< Réduire
Mots clés en anglais
thin films
phase change memory materials
chalcogenides
Ge-Sb-Te
Origine
Importé de halUnités de recherche