PALACIO-CUESTA, Marta; LIRAS, Marta; LABRUGÈRE, Christine; RODRIGUEZ-HERNANDEZ, Juan; GARCIA, Olga

doi:10.1002/pola.26318

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PALACIO-CUESTA, Marta
Instituto de Ciencia y Tecnologia de Polimeros [ICTP-CSIC]

LIRAS, Marta
Instituto de Ciencia y Tecnologia de Polimeros [ICTP-CSIC]

LABRUGÈRE, Christine
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]

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Journal of Polymer Science Part A: Polymer Chemistry. 2012, vol. 50, n° 23, p. 4902-4910

Wiley

Résumé en anglais

A new procedure focused on the design and preparation of structured and functional polymer surfaces by combination of two approaches acting simultaneously is developed. The elaboration of micrometer size patterned surfaces by UV-light lithography is reported where, in addition, the surface chemical composition can be controlled by surface segregation of a fluorinated copolymer incorporated in the photopolymerizable mixture. As evidenced by contact angle and XPS measurements, the surface composition can be modified depending on such factors as with the environmental conditions or the concentration of copolymer in the blend. Moreover, the functionality of the copolymer is enhanced by the surface pattern created. As a consequence, the wettability of the films can be modified depending on the pattern and composition of the blend. By using this methodology, functional adaptive sensitive surfaces with a well-defined topography will be obtained in one single step and without the use of tedious and time-consuming multistep procedures.< Réduire

Mots clés en anglais

Surface segregation

Annealing

Additives

Blending

Crosslinking

Fluorinated surface

Lithography

Micropatterned surface

Photolitography

Surfaces

Photopolymerization

Surface functionalization

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Functional micropatterned surfaces prepared by simultaneous UV-lithography and surface segregation of fluorinated copolymers

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