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hal.structure.identifierLaboratoire Interfaces et Systèmes Electrochimiques [LISE]
dc.contributor.authorNOBIAL, Myriam
dc.contributor.authorDEVOS, Olivier
IDREF: 162168861
hal.structure.identifierLaboratoire Interfaces et Systèmes Electrochimiques [LISE]
dc.contributor.authorTRIBOLLET, Bernard
dc.date.accessioned2021-05-14T10:03:28Z
dc.date.available2021-05-14T10:03:28Z
dc.date.issued2011
dc.identifier.issn0022-0248
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/78405
dc.description.abstractEnZnO electrodeposition on gold electrode was investigated by electrochemical and optical methods. The deposition was electrochemically generated by local pH enhancement. The influence of temperature, nitrate ions concentration and flow rate on the nucleation growth process was studied. The electrochemical impedance measurement led the high frequency capacity C-HF to be calculated versus time during the ZnO electrodeposition. As C-HF is proportional to the active surface, the correlation between the current and C-HF evolution was investigated.
dc.language.isoen
dc.publisherElsevier
dc.subject.enOptical microscopy
dc.subject.enElectrochemical growth
dc.subject.enOxides
dc.subject.enSemi conducting materials
dc.title.enElectrochemical and in situ optical investigations of ZnO deposition
dc.typeArticle de revue
dc.identifier.doi10.1016/j.jcrysgro.2011.03.056
dc.subject.halChimie/Autre
bordeaux.journalJournal of Crystal Growth
bordeaux.page173-181
bordeaux.volume327
bordeaux.hal.laboratoriesInstitut de Mécanique et d’Ingénierie de Bordeaux (I2M) - UMR 5295*
bordeaux.issue1
bordeaux.institutionUniversité de Bordeaux
bordeaux.institutionBordeaux INP
bordeaux.institutionCNRS
bordeaux.institutionINRAE
bordeaux.institutionArts et Métiers
bordeaux.peerReviewedoui
hal.identifierhal-00830704
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00830704v1
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