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Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning

dc.rights.licenseopen
hal.structure.identifierDépartement de Photochimie Générale [DPG]
dc.contributor.authorRIDAOUI, Hassan
hal.structure.identifierDépartement de Photochimie Générale [DPG]
dc.contributor.authorDIRANI, Ali
hal.structure.identifierDépartement de Photochimie Générale [DPG]
dc.contributor.authorSOPPERA, Olivier
dc.contributor.authorISMAILOVA, Esma
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorBROCHON, Cyril
dc.contributor.authorSCHLATTER, Guy
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorHADZIIOANNOU, Georges
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorTIRON, Raluca
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorBANDELIER, Philippe
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorSOURD, Claire
dc.date.accessioned2020
dc.date.available2020
dc.date.created2010
dc.date.issued2010
dc.identifier.issn0887-624X
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20511
dc.description.abstractEnNext generations of microelectronic devices request further miniaturized systems. In this context, photolithography is a key step and many efforts have been paid to develop new irradiation setup and materials compatible with sub-100 nm resolution. Among other resist platforms, chemically amplified photoresists (CAR) are widely used because of their excellent properties in terms of resolution, sensitivity, and etching resistance. However, low information on the impact of the polymer structure on the lithography performance is available. CAR with well-controlled polymer structures were thus prepared and investigated. In particular, the impact of the polymer structure on the lithographic performance was evaluated. Linear and branched polymers with various molecular weights and polyclispersities were compared. We focused on the dependency of the photosensitivity of the resist with the structural parameters. These results allow further understanding the fundamental phenomena involved by 193-nm irradiation.
dc.language.isoen
dc.publisherWiley
dc.subject.enresists
dc.subject.enphotoresists
dc.subject.enatomic force microscopy
dc.subject.enatom transfer radical polymerization
dc.subject.enchemically amplified photoresists
dc.subject.enhyperbranched polymer
dc.subject.ennanotechnology
dc.subject.enphotolithography
dc.title.enChemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
dc.typeArticle de revue
dc.identifier.doi10.1002/pola.23866
dc.subject.halChimie/Polymères
bordeaux.journalJournal of Polymer Science Part A: Polymer Chemistry
bordeaux.page1271-1277
bordeaux.volume48
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.issue6
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
bordeaux.peerReviewedoui
hal.identifierhal-00679919
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00679919v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal%20of%20Polymer%20Science%20Part%20A:%20Polymer%20Chemistry&rft.date=2010&rft.volume=48&rft.issue=6&rft.spage=1271-1277&rft.epage=1271-1277&rft.eissn=0887-624X&rft.issn=0887-624X&rft.au=RIDAOUI,%20Hassan&DIRANI,%20Ali&SOPPERA,%20Olivier&ISMAILOVA,%20Esma&BROCHON,%20Cyril&rft.genre=article


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