Afficher la notice abrégée

dc.rights.licenseopen
hal.structure.identifierGroupement de recherches de Lacq [GRL]
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorCHEVALIER, Xavier
hal.structure.identifierGroupement de recherches de Lacq [GRL]
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
dc.contributor.authorNICOLET, Célia
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorTIRON, Raluca
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorGHARBI, Ahmed
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorARGOUD, Maxime
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorPRADELLES, Jonathan
hal.structure.identifierLaboratoire des technologies de la microélectronique [LTM]
dc.contributor.authorDELALANDE, Michael
hal.structure.identifierLaboratoire des technologies de la microélectronique [LTM]
dc.contributor.authorCUNGE, Gilles
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorFLEURY, Guillaume
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorHADZIIOANNOU, Georges
hal.structure.identifierGroupement de recherches de Lacq [GRL]
dc.contributor.authorNAVARRO, Christophe
dc.date.accessioned2020
dc.date.available2020
dc.date.issued2013
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20397
dc.description.abstractEnPoly(styrene)-block-poly(methylmethacrylate) (PS-b-PMMA) block-copolymers (BCP) systems synthesized on an industrial scale and satisfying microelectronic's requirements for metallic contents specifications are studied in terms of integration capabilities for lithographic applications. We demonstrate in particular that this kind of polymer can efficiently achieve periodic features close to 10 nm. These thin films can be transferred in various substrates through dry-etching techniques. The self-assembly optimization for each polymer is first performed on free-surface, leading to interesting properties, and the changes in self-assembly rules for low molecular-weight polymers are investigated and highlighted through different graphoepitaxy approaches. The improvements in self-assembly capabilities toward low periodic polymers, as well as the broad range of achievable feature sizes, make the PS-b-PMMA system very attractive for lithographic CMOS applications. We conclude by showing that high-chi polymer materials developed in Arkema's laboratories can be efficiently used to reduce the pattern's size beyond the ones of PS-b-PMMA based BCP's capabilities. (C) 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)
dc.language.isoen
dc.subject.engraphoepitaxy
dc.subject.enlithography
dc.subject.enblock-copolymer
dc.subject.enself-assembly
dc.subject.enPS-b-PMMA
dc.title.enScaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
dc.typeArticle de revue
dc.identifier.doi10.1117/1.JMM.12.3.031102
dc.subject.halChimie/Polymères
bordeaux.journalJournal of Micro-Nanolitography MEMS and MOEMS
bordeaux.pageNb 031102
bordeaux.volume12
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.issue3
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
bordeaux.peerReviewedoui
hal.identifierhal-00926366
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00926366v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal%20of%20Micro-Nanolitography%20MEMS%20and%20MOEMS&rft.date=2013&rft.volume=12&rft.issue=3&rft.spage=Nb%20031102&rft.epage=Nb%20031102&rft.au=CHEVALIER,%20Xavier&NICOLET,%20C%C3%A9lia&TIRON,%20Raluca&GHARBI,%20Ahmed&ARGOUD,%20Maxime&rft.genre=article


Fichier(s) constituant ce document

FichiersTailleFormatVue

Il n'y a pas de fichiers associés à ce document.

Ce document figure dans la(les) collection(s) suivante(s)

Afficher la notice abrégée