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Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films

dc.rights.licenseopen
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
dc.contributor.authorAISSOU, Karim
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorMUMTAZ, Muhammad
hal.structure.identifierUniv Groningen, Zernike Inst Adv Mat, Macromol Chem & New Polym Mat
dc.contributor.authorPORTALE, Giuseppe
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorBROCHON, Cyril
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorCLOUTET, Eric
IDREF: 151048681
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorFLEURY, Guillaume
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorHADZIIOANNOU, Georges
dc.date.accessioned2020
dc.date.available2020
dc.date.issued2017
dc.identifier.issn1613-6810
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20124
dc.description.abstractEnThe directed self-assembly of diblock copolymer chains (poly(1,1-dimethylsilacyclobutane)-block-polystyrene, PDMSB-b-PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double-wave pattern formation is reported within the 3D-nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent-vapor annealing process results in very large grains (over 10 μm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub-100-nm-thick PDMSB-b-PS films.
dc.language.isoen
dc.publisherWiley-VCH Verlag
dc.subject.endouble gyroid
dc.subject.encopolymer
dc.subject.endirected self-assembly
dc.title.enTemplated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films
dc.typeArticle de revue
dc.identifier.doi10.1002/smll.201603777
dc.subject.halChimie/Polymères
bordeaux.journalSmall
bordeaux.page1603777
bordeaux.volume13
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.issue20
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
bordeaux.peerReviewedoui
hal.identifierhal-01505528
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01505528v1
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