Investigation of 0.18μm CMOS Sensitivity to BTI and HCI Mechanisms under Extreme Thermal Stress Conditions
dc.rights.license | open | en_US |
dc.contributor.author | TRAN, Yen | |
dc.contributor.author | NOMURA, Toshihiro | |
dc.contributor.author | CHERCHALI, Mohamed Salim | |
dc.contributor.author | TASSIN, Claire | |
hal.structure.identifier | Laboratoire de l'intégration, du matériau au système [IMS] | |
dc.contributor.author | DEVAL, Yann | |
hal.structure.identifier | Laboratoire de l'intégration, du matériau au système [IMS] | |
dc.contributor.author | MANEUX, Cristell
IDREF: 135213584 | |
dc.date.accessioned | 2024-04-30T08:04:24Z | |
dc.date.available | 2024-04-30T08:04:24Z | |
dc.date.issued | 2022-01-11 | |
dc.date.conference | 2021-11-22 | |
dc.identifier.issn | 2473-2001 | en_US |
dc.identifier.uri | oai:crossref.org:10.1109/ats52891.2021.00029 | |
dc.identifier.uri | https://oskar-bordeaux.fr/handle/20.500.12278/199520 | |
dc.description.abstract | Bias temperature instability (BTI) and hot carrier injection (HCI) are both prominent reliability concerns for integrated circuits (ICs). In this paper, we investigated these failure mechanisms on 0.18μm CMOS (Complementary Metal-Oxide-Semiconductor) submitted to severe temperatures (150°C and 210°C) for long period of stress (up to 2,000 hours). Additionally, the transistors were applied dedicated stress conditions to activate the intrinsic HCI and BTI wear-out mechanisms. The aging laws were proposed based on these experimental results and implemented into the commercial software tool for further investigation at logic circuit level. | |
dc.language.iso | EN | en_US |
dc.publisher | IEEE | en_US |
dc.source | crossref | |
dc.subject | Human computer interaction | |
dc.subject | Integrated circuits | |
dc.subject | Temperature sensors | |
dc.subject | Sensitivity | |
dc.subject | Software reliability | |
dc.subject | Transistors | |
dc.subject | Integrated circuit reliability | |
dc.subject | Reliability | |
dc.subject | Oilfield | |
dc.subject | 0.18μm CMOS | |
dc.subject | Extreme temperature | |
dc.subject | DC characterization | |
dc.subject | HCI | |
dc.subject | BTI | |
dc.title.en | Investigation of 0.18μm CMOS Sensitivity to BTI and HCI Mechanisms under Extreme Thermal Stress Conditions | |
dc.type | Communication dans un congrès | en_US |
dc.identifier.doi | 10.1109/ats52891.2021.00029 | en_US |
dc.subject.hal | Sciences de l'ingénieur [physics] | en_US |
bordeaux.page | 97-102 | en_US |
bordeaux.hal.laboratories | IMS : Laboratoire de l'Intégration du Matériau au Système - UMR 5218 | en_US |
bordeaux.institution | Université de Bordeaux | en_US |
bordeaux.institution | Bordeaux INP | en_US |
bordeaux.institution | CNRS | en_US |
bordeaux.conference.title | 2021 IEEE 30th Asian Test Symposium (ATS) | en_US |
bordeaux.country | jp | en_US |
bordeaux.title.proceeding | 2021 IEEE 30th Asian Test Symposium (ATS) | en_US |
bordeaux.team | CIRCUIT DESIGN-M4C | en_US |
bordeaux.team | CIRCUIT DESIGN-CAS | en_US |
bordeaux.conference.city | Matsuyama, Ehime | en_US |
bordeaux.import.source | dissemin | |
hal.identifier | hal-04563777 | |
hal.version | 1 | |
hal.date.transferred | 2024-04-30T08:04:26Z | |
hal.invited | oui | en_US |
hal.proceedings | oui | en_US |
hal.conference.end | 2021-11-25 | |
hal.popular | non | en_US |
hal.audience | Internationale | en_US |
hal.export | true | |
workflow.import.source | dissemin | |
dc.rights.cc | Pas de Licence CC | en_US |
bordeaux.COinS | ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.date=2022-01-11&rft.spage=97-102&rft.epage=97-102&rft.eissn=2473-2001&rft.issn=2473-2001&rft.au=TRAN,%20Yen&NOMURA,%20Toshihiro&CHERCHALI,%20Mohamed%20Salim&TASSIN,%20Claire&DEVAL,%20Yann&rft.genre=unknown |
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