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dc.rights.licenseopenen_US
dc.contributor.authorTRAN, Yen
dc.contributor.authorNOMURA, Toshihiro
dc.contributor.authorCHERCHALI, Mohamed Salim
dc.contributor.authorTASSIN, Claire
hal.structure.identifierLaboratoire de l'intégration, du matériau au système [IMS]
dc.contributor.authorDEVAL, Yann
hal.structure.identifierLaboratoire de l'intégration, du matériau au système [IMS]
dc.contributor.authorMANEUX, Cristell
IDREF: 135213584
dc.date.accessioned2024-04-30T08:04:24Z
dc.date.available2024-04-30T08:04:24Z
dc.date.issued2022-01-11
dc.date.conference2021-11-22
dc.identifier.issn2473-2001en_US
dc.identifier.urioai:crossref.org:10.1109/ats52891.2021.00029
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/199520
dc.description.abstractBias temperature instability (BTI) and hot carrier injection (HCI) are both prominent reliability concerns for integrated circuits (ICs). In this paper, we investigated these failure mechanisms on 0.18μm CMOS (Complementary Metal-Oxide-Semiconductor) submitted to severe temperatures (150°C and 210°C) for long period of stress (up to 2,000 hours). Additionally, the transistors were applied dedicated stress conditions to activate the intrinsic HCI and BTI wear-out mechanisms. The aging laws were proposed based on these experimental results and implemented into the commercial software tool for further investigation at logic circuit level.
dc.language.isoENen_US
dc.publisherIEEEen_US
dc.sourcecrossref
dc.subjectHuman computer interaction
dc.subjectIntegrated circuits
dc.subjectTemperature sensors
dc.subjectSensitivity
dc.subjectSoftware reliability
dc.subjectTransistors
dc.subjectIntegrated circuit reliability
dc.subjectReliability
dc.subjectOilfield
dc.subject0.18μm CMOS
dc.subjectExtreme temperature
dc.subjectDC characterization
dc.subjectHCI
dc.subjectBTI
dc.title.enInvestigation of 0.18μm CMOS Sensitivity to BTI and HCI Mechanisms under Extreme Thermal Stress Conditions
dc.typeCommunication dans un congrèsen_US
dc.identifier.doi10.1109/ats52891.2021.00029en_US
dc.subject.halSciences de l'ingénieur [physics]en_US
bordeaux.page97-102en_US
bordeaux.hal.laboratoriesIMS : Laboratoire de l'Intégration du Matériau au Système - UMR 5218en_US
bordeaux.institutionUniversité de Bordeauxen_US
bordeaux.institutionBordeaux INPen_US
bordeaux.institutionCNRSen_US
bordeaux.conference.title2021 IEEE 30th Asian Test Symposium (ATS)en_US
bordeaux.countryjpen_US
bordeaux.title.proceeding2021 IEEE 30th Asian Test Symposium (ATS)en_US
bordeaux.teamCIRCUIT DESIGN-M4Cen_US
bordeaux.teamCIRCUIT DESIGN-CASen_US
bordeaux.conference.cityMatsuyama, Ehimeen_US
bordeaux.import.sourcedissemin
hal.identifierhal-04563777
hal.version1
hal.date.transferred2024-04-30T08:04:26Z
hal.invitedouien_US
hal.proceedingsouien_US
hal.conference.end2021-11-25
hal.popularnonen_US
hal.audienceInternationaleen_US
hal.exporttrue
workflow.import.sourcedissemin
dc.rights.ccPas de Licence CCen_US
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.date=2022-01-11&rft.spage=97-102&rft.epage=97-102&rft.eissn=2473-2001&rft.issn=2473-2001&rft.au=TRAN,%20Yen&NOMURA,%20Toshihiro&CHERCHALI,%20Mohamed%20Salim&TASSIN,%20Claire&DEVAL,%20Yann&rft.genre=unknown


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