Recherche
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Fullerene-grafted block copolymers used as compatibilizer in P3HT/PCBM bulk heterojunctions: morphology and photovoltaic performances
(European Physical Journal: Applied Physics. vol. 56, n° 3, pp. art nb 34107, 2011)Article de revue -
Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
(Journal of Polymer Science Part A: Polymer Chemistry. vol. 48, n° 6, pp. 1271-1277, 2010)Article de revue