Listar Laboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629 por autor "NAVARRO, C."
Mostrando ítems 1-5 de 5
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Directed self assembling of block copolymers and their applications to ultra high density magnetic storage and maskless nano lithography
HADZIIOANNOU, Georges; AISSOU, Karim; FLEURY, Guillaume ...(246th National Meeting of the American-Chemical-Society (ACS), US, Indianapolis (IN), 2013)Communication dans un congrès avec actes -
Interface optimization for high-chi block copolymers materials with sub-10 nm resolution
PAQUET, A.; CHEVALIER, X.; LEGRAIN, A. ...(Micro- and Nano-Engineering conference - MNE 2017, PT, Braga)Communication dans un congrès avec actes -
Straightforward integration flow of a silicon containing block copolymer for line-space patterning
LEGRAIN, A.; FLEURY, Guillaume; MUMTAZ, M. ...(ACS Applied Materials & Interfaces. vol. vol. 9, pp. p. 43043, 2017)Article de revue -
Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning
NAVARRO, C.; NICOLET, C.; ARIURA, F. ...(34th International Conference of Photopolymer Science and Technology, JP, chiba)Communication dans un congrès avec actes -
Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning
NAVARRO, C.; NICOLET, C.; ARIURA, F. ...(Journal of Photopolymer Science and Technology. vol. 30, pp. 69-75, 2017)Article de revue