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dc.rights.licenseopenen_US
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorCHOLLON, Georges
dc.date.accessioned2023-10-23T12:24:29Z
dc.date.available2023-10-23T12:24:29Z
dc.date.issued2007-12-03
dc.identifier.issn0040-6090en_US
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/184500
dc.description.abstractEnThe polarization properties of Raman scattering have been utilized for the texture analysis of SiC-based and carbon coatings processed by CVD. A polarized Raman scattering analysis of the optical phonons was conducted to characterize the structural state of the SiC and aromatic carbon phases and appraise the possible preferential orientation of the SiC crystallites or the graphene layers in the coatings. This approach was applied through the Raman mappings of SiC-based and pyrocarbon coating cross-sections, for various structural materials such as CVD-monofilaments and C/C composites. The structural and textural properties of SiC and pyrocarbon coatings have been correlated with the CVD/CVI processes involved.
dc.language.isoENen_US
dc.subject.enRaman spectroscopy
dc.subject.enMicrostructure
dc.subject.enMicrotexture
dc.subject.enSilicon carbide
dc.subject.enPyrocarbon
dc.subject.enChemical vapour deposition (CVD)
dc.title.enStructural and textural analyses of SiC-based and carbon CVD coatings by Raman Microspectroscopy
dc.title.alternativeThin Solid Filmsen_US
dc.typeArticle de revueen_US
dc.identifier.doi10.1016/j.tsf.2007.06.098en_US
dc.subject.halChimie/Matériauxen_US
bordeaux.journalThin Solid Filmsen_US
bordeaux.page388-396en_US
bordeaux.volume516en_US
bordeaux.hal.laboratoriesLaboratoire des Composites Thermo Structuraux (LCTS) - UMR 5801en_US
bordeaux.issue2-4en_US
bordeaux.institutionUniversité de Bordeauxen_US
bordeaux.institutionCNRSen_US
bordeaux.institutionCEAen_US
bordeaux.peerReviewedouien_US
bordeaux.inpressnonen_US
bordeaux.import.sourcehal
hal.identifierhal-02326615
hal.version1
hal.popularnonen_US
hal.audienceInternationaleen_US
hal.exportfalse
workflow.import.sourcehal
dc.rights.ccPas de Licence CCen_US
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