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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMARTIN, Isabelle
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorVINATIER, Philippe
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLEVASSEUR, Alain
hal.structure.identifierInstitut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
dc.contributor.authorDUPIN, Jean-Charles
hal.structure.identifierInstitut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
dc.contributor.authorGONBEAU, Danielle
dc.date.issued1999
dc.identifier.issn0378-7753
dc.description.abstractEnAmorphous thin films of tungsten oxysulfide have been prepared by radio frequency (RF) magnetron sputtering. The composition of thin films is varied by changing the pressure of the reactive gas (O2) and discharge gas (Ar + O2) in the sputtering chamber. The X-ray photoelectron spectroscopy (XPS) studies of the thin films have shown three different types of environment for tungsten atoms: W6+ surrounded by oxygen O2-, W4+ surrounded by sulphur S2- and W5+ in a mixed oxygen-sulphur environment consisting of O2-, S2- and S22- pairs. The electrochemical characterisation of the film was performed in the Li/LiPF6-EC-DMC/WOySz cell. The XPS during intercalation evidences the role of W6+ and S22- in the redox process. © 1999 Elsevier Science S.A. All rights reserved.
dc.language.isoen
dc.publisherElsevier
dc.subject.enThin films
dc.subject.enXPS analysis
dc.subject.enLithium batteries
dc.subject.enRF magnetron sputtering
dc.subject.enTransition element oxysulfide
dc.title.enXPS analysis of the lithium intercalation in amorphous tungsten oxysulfide thin films
dc.typeArticle de revue
dc.identifier.doi10.1016/S0378-7753(99)00129-9
dc.subject.halChimie/Matériaux
dc.subject.halChimie/Chimie inorganique
bordeaux.journalJournal of Power Sources
bordeaux.page306-311
bordeaux.volume81-82
bordeaux.peerReviewedoui
hal.identifierhal-01636426
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01636426v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal%20of%20Power%20Sources&rft.date=1999&rft.volume=81-82&rft.spage=306-311&rft.epage=306-311&rft.eissn=0378-7753&rft.issn=0378-7753&rft.au=MARTIN,%20Isabelle&VINATIER,%20Philippe&LEVASSEUR,%20Alain&DUPIN,%20Jean-Charles&GONBEAU,%20Danielle&rft.genre=article


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