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Dielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering
hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
dc.contributor.author | BODEUX, Romain | |
hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
dc.contributor.author | MICHAU, Dominique | |
hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
dc.contributor.author | JOSSE, Michaël | |
hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
dc.contributor.author | MAGLIONE, Mario | |
dc.date.issued | 2014 | |
dc.identifier.issn | 1293-2558 | |
dc.description.abstractEn | Tetragonal tungsten bronze (TTB) films have been synthesised on Pt(111)/TiO2/SiO2/Si substrates from Ba2LnFeNb4O15 ceramics (Ln = La, Nd, Eu) by RF magnetron sputtering. X-ray diffraction measurements evidenced the multi-oriented nature of films with some degrees of preferential orientation along (111). The dependence of the dielectric properties on temperature and frequency has been investigated. The dielectric properties of the films are similar to those of the bulk, i.e., ε ∼150 and σ ∼10−6 Ω−1 cm−1 at 1 MHz and room temperature. The films exhibit two dielectric anomalies which are attributed to Maxwell Wagner polarization mechanism and relaxor behaviour. Both anomalies are sensitive to post-annealing under oxygen atmosphere and their activation energies are similar Ea ∼0.30 eV. They are explained in terms of electrically heterogeneous contributions in the films. | |
dc.description.sponsorship | Croissance Cristalline d'Oxydes Dielectriques - ANR-09-JCJC-0079 | |
dc.language.iso | en | |
dc.publisher | Elsevier | |
dc.subject.en | TTB | |
dc.subject.en | PVD | |
dc.subject.en | Semiconductor oxide | |
dc.subject.en | Interfaces | |
dc.subject.en | Schottky barrier | |
dc.subject.en | Ferroelectric | |
dc.title.en | Dielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering | |
dc.type | Article de revue | |
dc.identifier.doi | 10.1016/j.solidstatesciences.2014.10.007 | |
dc.subject.hal | Chimie/Matériaux | |
bordeaux.journal | Solid State Sciences | |
bordeaux.page | 112-118 | |
bordeaux.volume | 38 | |
bordeaux.peerReviewed | oui | |
hal.identifier | hal-01078544 | |
hal.version | 1 | |
hal.popular | non | |
hal.audience | Internationale | |
hal.origin.link | https://hal.archives-ouvertes.fr//hal-01078544v1 | |
bordeaux.COinS | ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Solid%20State%20Sciences&rft.date=2014&rft.volume=38&rft.spage=112-118&rft.epage=112-118&rft.eissn=1293-2558&rft.issn=1293-2558&rft.au=BODEUX,%20Romain&MICHAU,%20Dominique&JOSSE,%20Micha%C3%ABl&MAGLIONE,%20Mario&rft.genre=article |
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