Afficher la notice abrégée

Effect of total pressure on La 2 NiO 4 coatings deposited by reactive magnetron sputtering using plasma emission monitoring

hal.structure.identifierLaboratoire d'Études et de Recherches sur les Matériaux, les Procédés et les Surfaces [IRTES - LERMPS]
hal.structure.identifierFuel Cell LAB : Vers des Systèmes Pile à Combustible Efficients [FCLAB]
dc.contributor.authorFONDARD, Jérémie
hal.structure.identifierLaboratoire d'Études et de Recherches sur les Matériaux, les Procédés et les Surfaces [IRTES - LERMPS]
hal.structure.identifierFuel Cell LAB : Vers des Systèmes Pile à Combustible Efficients [FCLAB]
dc.contributor.authorBILLARD, Alain
hal.structure.identifierCentre interuniversitaire de recherche et d'ingénierie des matériaux [CIRIMAT]
dc.contributor.authorBERTRAND, Ghislaine
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorFOURCADE, Sébastien
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorBATOCCHI, Pierre
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMAUVY, Fabrice
hal.structure.identifierLaboratoire d'Études et de Recherches sur les Matériaux, les Procédés et les Surfaces [IRTES - LERMPS]
hal.structure.identifierFuel Cell LAB : Vers des Systèmes Pile à Combustible Efficients [FCLAB]
dc.contributor.authorBRIOIS, Pascal
dc.date.issued2016-06-15
dc.identifier.issn0257-8972
dc.description.abstractEnThis work focuses on the structural, microstructural, electrical and electrochemical characterization of La–Ni–O coatings deposited by reactive magnetron sputtering under different argon partial pressures. Deposition was driven by Plasma Emission Monitoring system (PEM) which allows high deposition rate. For each pressure, the optimal regulation setpoint for lanthanum oxide deposition is determined and then the current dissipated on the nickel target is adjusted to obtain the convenient La/Ni ratio to achieve the K2NiF4 structure. After an appropriate annealing treatment, coatings crystallize in the desired structure with more or less impurities. Increasing the device's pressure from 0.4 to 4.8Pa produces more porous samples with different microstructures. Then, a coating with porosity gradient was built by using these four different total pressures. Its electrical performances were tested and allowed its utilization as cathode layer in intermediate temperature-solid oxide fuel cell (IT-SOFC). This modified architecture cathode allows better performances (71mW·cm−2) than dense cathode produced by the same technique (51mW·cm−2).
dc.language.isoen
dc.publisherElsevier
dc.subject.enLa2NiO4
dc.subject.enReactive magnetron sputtering
dc.subject.enEffect of total pressure
dc.subject.enIntermediate-temperature solid oxide fuel cell
dc.subject.enComplete cell tests
dc.title.enEffect of total pressure on La 2 NiO 4 coatings deposited by reactive magnetron sputtering using plasma emission monitoring
dc.typeArticle de revue
dc.identifier.doi10.1016/j.surfcoat.2015.11.053
dc.subject.halChimie/Matériaux
dc.subject.halSciences de l'ingénieur [physics]/Matériaux
bordeaux.journalSurface and Coatings Technology
bordeaux.page29-36
bordeaux.volume295
bordeaux.peerReviewedoui
hal.identifierhal-02430400
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-02430400v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Surface%20and%20Coatings%20Technology&rft.date=2016-06-15&rft.volume=295&rft.spage=29-36&rft.epage=29-36&rft.eissn=0257-8972&rft.issn=0257-8972&rft.au=FONDARD,%20J%C3%A9r%C3%A9mie&BILLARD,%20Alain&BERTRAND,%20Ghislaine&FOURCADE,%20S%C3%A9bastien&BATOCCHI,%20Pierre&rft.genre=article


Fichier(s) constituant ce document

FichiersTailleFormatVue

Il n'y a pas de fichiers associés à ce document.

Ce document figure dans la(les) collection(s) suivante(s)

Afficher la notice abrégée