Sputtered lithium nickel vanadium oxide (LiNiVO<sub>4</sub>) films: Chemical compositions, structural variations, target history, and anodic/cathodic electrochemical properties
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| hal.structure.identifier | Department of Physics (Singapore) | |
| dc.contributor.author | REDDY, V. Venkatashamy | |
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | LEVASSEUR, Alain | |
| dc.date.issued | 2010 | |
| dc.identifier.issn | 0022-0728 | |
| dc.description.abstractEn | In this paper, we report the chemical compositional variations and target surface history of lithium nickel vanadate material during RF-magnetron sputtering. Amorphous films were characterized by nuclear methods [Rutherford backscattering spectroscopy (RBS) and nuclear reaction analysis (NRA)], Auger electron spectroscopy (AES), X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), and high resolution transmission electron microscopy (HTEM) techniques. Various nanostructured/porous LiNiVO<sub>4</sub> thin film materials were obtained, depending on the composition of films, total pressure, annealing temperatures, thickness and heating time. Optimum film composition was obtained with the sputtering parameters; oxygen partial pressure (<i>P<sub>o</sub></i><sub>2</sub>) = 10 mPa, total pressure of (<i>P</i><sub>Ar</sub>) = 1 Pa, Rf-power = 30 W. Cathodic and anodic electrochemical properties of LiNiVO<sub>4</sub> films were evaluated by galvanostatic cycling at constant current and cyclic voltammetry electroanalytical techniques. Electrochemical performance of the LiNiVO<sub>4</sub> film deliver a capacity of 780 mA hg<sup>−1</sup> (10th cycle), potential range, 0.02–3.0 V (anodic), at a current rate, 75 μA cm<sup>−2</sup>. In the potential range 1.2–4.5 V, deliver a capacity of 280 mA hg<sup>−1</sup>, and in the potential window, 3.0–4.8 V (cathodic), 0.6 Li are removed from the host LiNiVO<sub>4</sub> lattice. | |
| dc.language.iso | en | |
| dc.publisher | Elsevier | |
| dc.title.en | Sputtered lithium nickel vanadium oxide (LiNiVO<sub>4</sub>) films: Chemical compositions, structural variations, target history, and anodic/cathodic electrochemical properties | |
| dc.type | Article de revue | |
| dc.identifier.doi | 10.1016/j.jelechem.2009.10.034 | |
| dc.subject.hal | Chimie/Matériaux | |
| bordeaux.journal | Journal of electroanalytical chemistry and interfacial electrochemistry | |
| bordeaux.page | 27-35 | |
| bordeaux.volume | 639 | |
| bordeaux.issue | 1-2 | |
| bordeaux.peerReviewed | oui | |
| hal.identifier | hal-00466367 | |
| hal.version | 1 | |
| hal.popular | non | |
| hal.audience | Internationale | |
| hal.origin.link | https://hal.archives-ouvertes.fr//hal-00466367v1 | |
| bordeaux.COinS | ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal%20of%20electroanalytical%20chemistry%20and%20interfacial%20electrochemistry&rft.date=2010&rft.volume=639&rft.issue=1-2&rft.spage=27-35&rft.epage=27-35&rft.eissn=0022-0728&rft.issn=0022-0728&rft.au=REDDY,%20V.%20Venkatashamy&LEVASSEUR,%20Alain&rft.genre=article |
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