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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorTRESSAUD, Alain
dc.date.issued2011
dc.description.abstractEnTreatments involving fluorinated gases and radio-frequency plasma-enhanced fluorination (PEF) constitute exceptional tools for modifying at low temperature the surface properties of materials. These techniques are adapted to yield nanosized functionalized materials and will be illustrated by several examples, including carbon-based electrode materials, functionalized silica and silicates, switchable hydrophobic-hydrophilic porous alumina. X-ray photoelectron spectroscopy is a preferred method for characterizing the resulting surface modifications.
dc.language.isoen
dc.subject.enFluorine
dc.subject.enMaterials science
dc.subject.enPlasma
dc.title.enPlasma-enhanced fluorination in materials science
dc.typeArticle de revue
dc.subject.halChimie/Matériaux
bordeaux.journalChimica Oggi - Chemistry Today
bordeaux.page36-39
bordeaux.volume29
bordeaux.issue3
bordeaux.peerReviewedoui
hal.identifierhal-00602027
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00602027v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Chimica%20Oggi%20-%20Chemistry%20Today&rft.date=2011&rft.volume=29&rft.issue=3&rft.spage=36-39&rft.epage=36-39&rft.au=TRESSAUD,%20Alain&rft.genre=article


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