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Characterization of rf sputtered TiOySz thin films

hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLINDIC, Marie-Hélène
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPECQUENARD, Brigitte
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorVINATIER, Philippe
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLEVASSEUR, Alain
hal.structure.identifierInstitut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
dc.contributor.authorMARTINEZ, Hervé
hal.structure.identifierLaboratoire de Chimie théorique et Physico-chimie moléculaire [LCTPCM]
dc.contributor.authorGONBEAU, Danielle
hal.structure.identifierInstitut des Matériaux Jean Rouxel [IMN]
dc.contributor.authorPETIT, Pierre Emmanuel
hal.structure.identifierInstitut des Matériaux Jean Rouxel [IMN]
dc.contributor.authorOUVRARD, Guy
dc.date.issued2005
dc.identifier.issn0040-6090
dc.description.abstractEnDifferent titanium oxysulfide thin films were prepared by rf magnetron sputtering using two types of targets in a pure argon or mixed oxygen/argon atmosphere with a total pressure of 1 or 0.2 Pa. We have studied the influence of the sputtering conditions (target, total pressure, oxygen partial pressure) on the composition, the morphology and the local and electronic structure of our thin films. A set of complementary techniques (scanning electron microscopy, X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS)) was used to characterize the thin films. Two types of films have been obtained: thin films prepared from TiS2 target having a composition and a local structure close to TiS3 and thin films obtained from TiS2/TiS3 target characterized by a composition and a local structure close to TiS2. The complementary use of XPS and sulfur K-edge XAS spectroscopies has allowed us to evidence the coexistence of different microdomains into the thin films corresponding respectively to a pure sulfur, a pure oxygen or a mixed sulfur/oxygen environment.
dc.language.isoen
dc.publisherElsevier
dc.subject.enThin films
dc.subject.enScanning Electron Microscopy
dc.subject.enTitanium Sulfides
dc.subject.enTitanium oxysulfides
dc.subject.enTransmission Electron Microscopy
dc.subject.enX-Ray Diffraction
dc.subject.enX-Ray Photoelectron Spectroscopy
dc.title.enCharacterization of rf sputtered TiOySz thin films
dc.typeArticle de revue
dc.identifier.doi10.1016/j.tsf.2005.02.014
dc.subject.halPhysique [physics]/Matière Condensée [cond-mat]/Science des matériaux [cond-mat.mtrl-sci]
dc.subject.halChimie/Matériaux
bordeaux.journalThin Solid Films
bordeaux.page113
bordeaux.volume484
bordeaux.issue1-2
bordeaux.peerReviewedoui
hal.identifierhal-00022281
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00022281v1
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