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Impact of molecular structure of polymer in 193 nm resist performance

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hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorISMAILOVA, Esma
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorTIRON, Raluca
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorCHOCHOS, Christos L.
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorBROCHON, Cyril
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorBANDELIER, Philippe
hal.structure.identifierRohm et Haas Electronic Materials
dc.contributor.authorPERRET, Damien
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorSOURD, Claire
hal.structure.identifierRohm et Haas Electronic Materials
dc.contributor.authorBRAULT, Christophe
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorSERRA, Christophe A.
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorSCHLATTER, Guy
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorHADZIIOANNOU, Georges
dc.date.accessioned2020
dc.date.available2020
dc.date.issued2009
dc.identifier.issn0167-9317
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20375
dc.description.abstractEnMiniaturization in microelectronic technologies requests a development of new high-performance materials for microlithography with good resolution of the critical dimension. However, the real impact of polymer structure on lithographic performances is not yet well understood to predict the properties of formulated resist. Our approach is the synthesis and characterization of model resists and the understanding of the relationship between material - properties - processes. In this work we present the influence of the polymer's molecular weight in lithographic profile of the generated patterns. The limits of the polymer's molecular weight values based on model terpolymers, consisting of methacrylate matrix, for efficient patterning have been identified. Finally, the ineffective sensitivity and dissolution issue of the polymer resists having an average molecular weight of 30 kg/mol was extensively examined and attributed to the molecular weight of the polymer and more precisely to the radius of gyration of the polymer.
dc.language.isoen
dc.publisherElsevier
dc.subject.enResist
dc.subject.enPhoto acid generator
dc.subject.enMolecular weight
dc.subject.enPolymer structure
dc.subject.en193 nm Lithography
dc.title.enImpact of molecular structure of polymer in 193 nm resist performance
dc.typeArticle de revue
dc.identifier.doi10.1016/j.mee.2008.11.072
dc.subject.halChimie/Polymères
bordeaux.journalMicroelectronic Engineering
bordeaux.page796-799
bordeaux.volume86
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.issue4-6
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
bordeaux.peerReviewedoui
hal.identifierhal-00945158
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00945158v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Microelectronic%20Engineering&rft.date=2009&rft.volume=86&rft.issue=4-6&rft.spage=796-799&rft.epage=796-799&rft.eissn=0167-9317&rft.issn=0167-9317&rft.au=ISMAILOVA,%20Esma&TIRON,%20Raluca&CHOCHOS,%20Christos%20L.&BROCHON,%20Cyril&BANDELIER,%20Philippe&rft.genre=article


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