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Third Order Nonlinear Optical Susceptibility of Crystalline Oxide Yttria-Stabilized Zirconia

hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorMARCAUD, Guillaume
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorSERNA, Samuel
hal.structure.identifierInstitut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
dc.contributor.authorKARAMANIS, Panaghiotis
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorALONSO-RAMOS, Carlos
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorLE ROUX, Xavier
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorBERCIANO, Mathias
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorMAROUTIAN, Thomas
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorAGNUS, Guillaume
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorAUBERT, Pascal
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorJOLLIVET, Arnaud
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorRUIZ-CARIDAD, Alicia
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorLARGEAU, Ludovic
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorISAC, Nathalie
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorCASSAN, Eric
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorMATZEN, Sylvia
hal.structure.identifierLaboratoire Photonique, Numérique et Nanosciences [LP2N]
dc.contributor.authorDUBREUIL, Nicolas
hal.structure.identifierInstitut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
dc.contributor.authorRÉRAT, Michel
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorLECOEUR, Philippe
hal.structure.identifierCentre de Nanosciences et Nanotechnologies [C2N (UMR_9001)]
dc.contributor.authorVIVIEN, Laurent
dc.date.accessioned2023-05-12T10:43:50Z
dc.date.available2023-05-12T10:43:50Z
dc.date.issued2020
dc.identifier.issn2327-9125
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/181684
dc.description.abstractEnNonlinear all-optical technology is an ultimate route for next generation ultra-fast signal processing of optical communication system. New nonlinear functionalities need to be implemented in photonics and complex oxides are considered as promising candidates due to their wide panel of attributes. In this context, Yttria-Stabilized Zirconia (YSZ) stands out thanks to its capability to be epitaxially grown on silicon, adapting the lattice for the crystalline oxides family of materials. We report for the first time a detailed theoretical and experimental study about the third order nonlinear susceptibility in crystalline YSZ. Via self-phase modulation induced broadening and considering the in-plane orientation of YSZ, we experimentally obtained an effective Kerr coefficient of n Y SZ 2 = 4.0 ± 2 · 10 −19 m 2 W −1 in a 8%mol. YSZ waveguide. In agreement with the theoretically predicted n Y SZ 2 = 1.3 · 10 −19 m 2 W −1 , the third order nonlinear coefficient of YSZ is comparable to the one of silicon nitride (SiN), already used in nonlinear optics. These promising results are a new step towards the implementation of functional oxides for nonlinear optical applications.
dc.language.isoen
dc.publisherOptical Society of America
dc.title.enThird Order Nonlinear Optical Susceptibility of Crystalline Oxide Yttria-Stabilized Zirconia
dc.typeArticle de revue
dc.identifier.doi10.1364/PRJ.8.000110
dc.subject.halChimie/Chimie théorique et/ou physique
dc.subject.halChimie/Matériaux
bordeaux.journalPhotonics research
bordeaux.page110-120
bordeaux.volume8
bordeaux.hal.laboratoriesLaboratoire Photonique, Numérique et Nanosciences (LP2N) - UMR 5298*
bordeaux.issue2
bordeaux.institutionUniversité de Bordeaux
bordeaux.institutionCNRS
bordeaux.peerReviewedoui
hal.identifierhal-02389837
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-02389837v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Photonics%20research&rft.date=2020&rft.volume=8&rft.issue=2&rft.spage=110-120&rft.epage=110-120&rft.eissn=2327-9125&rft.issn=2327-9125&rft.au=MARCAUD,%20Guillaume&SERNA,%20Samuel&KARAMANIS,%20Panaghiotis&ALONSO-RAMOS,%20Carlos&LE%20ROUX,%20Xavier&rft.genre=article


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