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Effects of deep wet etching in HF/HNO$_3$ and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm

hal.structure.identifierCommissariat à l'Energie Atomique et aux Energies Alternatives [CEA-CESTA]
dc.contributor.authorPFIFFER, Mathilde
hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorCORMONT, Philippe
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorFARGIN, Evelyne
hal.structure.identifierCentre d'Etudes Lasers Intenses et Applications [CELIA]
dc.contributor.authorBOUSQUET, Bruno
hal.structure.identifierInstitut des Sciences Moléculaires [ISM]
dc.contributor.authorDUSSAUZE, Marc
hal.structure.identifierCEA Le Ripault [CEA Le Ripault]
dc.contributor.authorLAMBERT, Sébastien
hal.structure.identifierCommissariat à l'Energie Atomique et aux Energies Alternatives [CEA-CESTA]
dc.contributor.authorNEAUPORT, Jérôme
dc.date.issued2017
dc.identifier.issn1094-4087
dc.description.abstractEnWe investigate the interest of deep wet etching with HF/HNO$_3$ or KOH solutions as a final step after polishing to improve fused silica optics laser damage resistance at the wavelength of 351 nm. This comparison is carried out on scratches engineered on high damage threshold polished fused silica optics. We evidence that both KOH and HF/HNO$_3$ solutions are efficient to passivate scratches and thus improve their damage threshold up to the level of the polished surface. The effect of these wet etchings on surface roughness and aspect is also studied. We show that KOH solution exhibit better overall surface quality that HF/HNO$_3$ solution in the tested conditions. Given the safety difficulties associated with the processing with HF, KOH solution appears as a pertinent alternative to HF deep wet etching.
dc.language.isoen
dc.publisherOptical Society of America - OSA Publishing
dc.title.enEffects of deep wet etching in HF/HNO$_3$ and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm
dc.typeArticle de revue
dc.identifier.doi10.1364/OE.25.004607
dc.subject.halPhysique [physics]/Physique [physics]/Optique [physics.optics]
bordeaux.journalOptics Express
bordeaux.page4607-4619
bordeaux.volume25
bordeaux.peerReviewedoui
hal.identifiercea-01622297
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//cea-01622297v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Optics%20Express&rft.date=2017&rft.volume=25&rft.spage=4607-4619&rft.epage=4607-4619&rft.eissn=1094-4087&rft.issn=1094-4087&rft.au=PFIFFER,%20Mathilde&CORMONT,%20Philippe&FARGIN,%20Evelyne&BOUSQUET,%20Bruno&DUSSAUZE,%20Marc&rft.genre=article


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