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Understanding the effect of wet etching on damage resistance of surface scratches

hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorDA COSTA FERNANDES, Benoit
hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorPFIFFER, Mathilde
hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorCORMONT, Philippe
hal.structure.identifierInstitut des Sciences Moléculaires [ISM]
dc.contributor.authorDUSSAUZE, Marc
hal.structure.identifierCentre d'Etudes Lasers Intenses et Applications [CELIA]
dc.contributor.authorBOUSQUET, Bruno
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorFARGIN, Evelyne
hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorNÉAUPORT, Jérôme
dc.date.issued2018-12
dc.identifier.issn2045-2322
dc.description.abstractEnFused silica optics often exhibit surface scratches after polishing that radically reduce their damage resistance at the wavelength of 351 nm in the nanosecond regime. Consequently, chemical treatments after polishing are often used to increase the damage threshold and ensure a safe operation of these optics in large fusion-scale laser facilities. Here, we investigate the reasons for such an improvement. We study the effect of an HF-based wet etching on scratch morphology and propose a simple analytic model to reflect scratch widening during etching. We also use a finite element model to evaluate the effect of the morphological modification induced by etching on the electric field distribution in the vicinity of the scratch. We evidence that this improvement of the scratch damage resistance is due to a reduction of the electric field enhancement. This conclusion is supported by secondary electron microscopy (SEM) imaging of damage sites initiated on scratches after chemical treatment.
dc.language.isoen
dc.publisherNature Publishing Group
dc.title.enUnderstanding the effect of wet etching on damage resistance of surface scratches
dc.typeArticle de revue
dc.identifier.doi10.1038/s41598-018-19716-0
dc.subject.halChimie/Matériaux
bordeaux.journalScientific Reports
bordeaux.page1337 (9 p.)
bordeaux.volume8
bordeaux.issue1
bordeaux.peerReviewedoui
hal.identifierhal-01869778
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01869778v1
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