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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
hal.structure.identifierDepartment of Materials and Earth Sciences [Darmstadt]
dc.contributor.authorCASTRO-CHAVARRIA, Christopher
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPAYAN, Sandrine
hal.structure.identifierPlateforme Aquitaine de Caractérisation des Matériaux [PLACAMAT]
dc.contributor.authorSALVETAT, Jean-Paul
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMAGLIONE, Mario
hal.structure.identifierDepartment of Materials and Earth Sciences [Darmstadt]
dc.contributor.authorKLEIN, Andreas
dc.date.issued2020
dc.identifier.issn2571-9637
dc.description.abstractEnMultilayered doped BaTiO3 thin films have been fabricated by physical vapor deposition (PVD) on low-cost polycrystalline substrates with the aim to improve dielectric properties by controlling point charge defects at the interfaces. We show that carefully designed interfaces lead to increasing the relative permittivity of the BaTiO3 thin films, in contradiction with the common belief that interfaces behave as dead layers. High relative permittivity up to 1030 and tanδ = 4% at 100 kHz and room temperature were obtained on BaTiO3 multilayered films deposited on Si/Pt substrates by PVD. The large permittivity is suspected to be an extrinsic contribution due to band bending at the interfaces, as inferred by in-situ X-ray photoelectron spectroscopy. A 20-nm depletion layer was found to be associated with an interdiffusion of dopants, as measured by depth profiling with time-of-flight secondary ion mass spectrometry. The films exhibit high permittivity and low dielectric losses stable between 200 and 400 K, which meet the requirement of electronic applications
dc.language.isoen
dc.publisherMDPI
dc.subject.enthin films
dc.subject.enbarium titanate
dc.subject.enXPS
dc.subject.enTOF-SIMS
dc.subject.ensurface analysis
dc.subject.enlarge permittivity
dc.subject.enFermi level position
dc.subject.eninterfaces
dc.title.enFermi level engineering for large permittivity in BaTiO3-based multilayers
dc.typeArticle de revue
dc.identifier.doi10.3390/surfaces3040038
dc.subject.halChimie/Matériaux
bordeaux.journalSurfaces
bordeaux.page567-578
bordeaux.volume3
bordeaux.issue4
bordeaux.peerReviewedoui
hal.identifierhal-03132453
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-03132453v1
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