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Direct writing of graphene patterns on insulating substrates under ambient conditions

hal.structure.identifierDepartment of Electrical Engineering
dc.contributor.authorXIONG, Wei
hal.structure.identifierDepartment of Electrical Engineering
dc.contributor.authorZHOU, Yun Shen
hal.structure.identifierDepartment of Electrical Engineering
dc.contributor.authorHOU, Wen Jia
hal.structure.identifierDepartment of Electrical Engineering
dc.contributor.authorJIANG, Li Jia
hal.structure.identifierDepartment of Electrical Engineering
dc.contributor.authorGAO, Yang
hal.structure.identifierDepartment of Electrical Engineering
dc.contributor.authorFAN, Li Sha
hal.structure.identifierSchool of Mechanical Engineering
dc.contributor.authorJIANG, Lan
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorSILVAIN, Jean-François
hal.structure.identifierDepartment of Electrical Engineering
dc.contributor.authorLU, Yong Feng
dc.date.issued2014
dc.identifier.issn2045-2322
dc.description.abstractEnScientific Reports | Article Open Print Email Share/bookmark Direct writing of graphene patterns on insulating substrates under ambient conditions Wei Xiong, Yun Shen Zhou, Wen Jia Hou, Li Jia Jiang, Yang Gao, Li Sha Fan, Lan Jiang, Jean Francois Silvain & Yong Feng Lu Affiliations Contributions Corresponding author Scientific Reports 4, Article number: 4892 doi:10.1038/srep04892 Received 05 March 2014 Accepted 17 April 2014 Published 08 May 2014 Article tools PDF Citation Reprints Rights & permissions Article metrics To unleash the full potential of graphene in electronics and optoelectronics, high-quality graphene patterns on insulating substrates are required. However, existing methods generally follow a "synthesis + patterning" strategy, which are time consuming and costly for fabricating high-quality graphene patterns on desired substrates. We developed a nanofabrication process to deposit high-quality graphene patterns directly on insulating substrates via a solid-phase laser direct writing (LDW) process. Open-air and room-temperature fabrication of graphene patterns on insulating substrates has been achieved via a femtosecond LDW process without graphene transfer and patterning. Various graphene patterns, including texts, spirals, line arrays, and integrated circuit patterns, with a feature line width of 800 nm and a low sheet resistance of 205 ohm/sq, were fabricated. The LDW method provides a facile and cost-effective way to fabricate complex and high-quality graphene patterns directly on target substrates, which opens a door for fabricating various advanced functional devices.
dc.language.isoen
dc.publisherNature Publishing Group
dc.subject.enNanoscale materials
dc.subject.enSynthesis of graphene
dc.title.enDirect writing of graphene patterns on insulating substrates under ambient conditions
dc.typeArticle de revue
dc.identifier.doi10.1038/srep04892
dc.subject.halSciences de l'ingénieur [physics]/Matériaux
dc.subject.halSciences de l'ingénieur [physics]/Micro et nanotechnologies/Microélectronique
bordeaux.journalScientific Reports
bordeaux.page4892
bordeaux.volume4
bordeaux.peerReviewedoui
hal.identifierhal-00991135
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00991135v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Scientific%20Reports&rft.date=2014&rft.volume=4&rft.spage=4892&rft.epage=4892&rft.eissn=2045-2322&rft.issn=2045-2322&rft.au=XIONG,%20Wei&ZHOU,%20Yun%20Shen&HOU,%20Wen%20Jia&JIANG,%20Li%20Jia&GAO,%20Yang&rft.genre=article


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