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hal.structure.identifierDepartment of Electronic Chemistry Interdisciplinary Graduate School of Science
hal.structure.identifierDepartment of Chemical System Engineering
dc.contributor.authorYAMADA, Atsuo
hal.structure.identifierDepartment of Electronic Chemistry Interdisciplinary Graduate School of Science
dc.contributor.authorSAKA, Kazuyuki
hal.structure.identifierDepartment of Electronic Chemistry Interdisciplinary Graduate School of Science
dc.contributor.authorUEHARA, Makiko
hal.structure.identifierDepartment of Electronic Chemistry Interdisciplinary Graduate School of Science
dc.contributor.authorTAMINATO, Sou
hal.structure.identifierDepartment of Electronic Chemistry Interdisciplinary Graduate School of Science
dc.contributor.authorKANNO, Ryoji
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMAUVY, Fabrice
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorGRENIER, Jean-Claude
dc.date.issued2010
dc.identifier.issn1388-2481
dc.description.abstractEnElectrode-electrolyte hetero-epitaxial systems for solid oxide fuel cells (SOFCs) with two different configuration of Nd<sub>2</sub>NiO<sub>4+δ</sub>(110)//YSZ(100) and Nd<sub>2</sub>NiO<sub>4+δ</sub>(100)//YSZ(110) were successfully fabricated by pulsed laser deposition. Thin films of Nd<sub>2</sub>NiO<sub>4+δ</sub> approximately 20 nm thick were grown on a commercial single crystal of YSZ. The preferred two-dimensional diffusion paths of the oxide ions were perpendicular to the substrate for both configurations and showed oxygen reduction capability different from each other. This opens up new research direction focusing on the details of anisotropic catalytic activity of SOFC cathode depending on the crystalline surface.
dc.language.isoen
dc.publisherElsevier
dc.subject.enK2NiF4
dc.subject.enSolid oxide fuel cell
dc.subject.enEpitaxial film
dc.subject.enOxygen reduction
dc.subject.enAnisotropy
dc.title.enAnisotropic catalytic activity of the orientation controlled Nd<sub>2</sub>NiO<sub>4+δ</sub>/YSZ hetero-epitaxial system for SOFC cathode
dc.typeArticle de revue
dc.identifier.doi10.1016/j.elecom.2010.09.026
dc.subject.halChimie/Matériaux
bordeaux.journalElectrochemistry Communications
bordeaux.page1690-1693
bordeaux.volume12
bordeaux.issue12
bordeaux.peerReviewedoui
hal.identifierhal-00549336
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00549336v1
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