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Tribological behaviour of hard coatings deposited by arc-evaporation PVD

hal.structure.identifierIngeniería Avanzada de Superficies
dc.contributor.authorRODRÍGUEZ, R. J.
hal.structure.identifierIngeniería Avanzada de Superficies
dc.contributor.authorGARCÍA, J. A.
hal.structure.identifierIngeniería Avanzada de Superficies
dc.contributor.authorMEDRANO, A.
hal.structure.identifierIngeniería Avanzada de Superficies
dc.contributor.authorRICO, M.
hal.structure.identifierIngeniería Avanzada de Superficies
dc.contributor.authorSÁNCHEZ, R.
hal.structure.identifierIngeniería Avanzada de Superficies
dc.contributor.authorMARTÍNEZ, R.
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLABRUGÈRE, Christine
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLAHAYE, Michel
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorGUETTE, Alain
dc.date.issued2002
dc.identifier.issn0042-207X
dc.description.abstractEnHard coatings deposited by arc-evaporation PVD are adequate solutions for increasing the lifetime of tools and components commonly employed in many different industrial applications. The present paper reports a comparative study of the tribological properties of the most employed hard coatings like TiN, TiCN, TiAlN, CrN and ZrN. In this study, microhardness tests were carried out by using a microindenter. Friction and wear tests were carried out by using a ball-on-disk tribometer and an optical profilometer. AUGER and XPS techniques were employed to measure the stoichiometry and thickness of the different films.
dc.language.isoen
dc.publisherElsevier
dc.subject.enPVD
dc.subject.enArc electric
dc.subject.enHard coatings
dc.subject.enMicrohardness
dc.subject.enWear
dc.subject.enFriction
dc.subject.enTribology
dc.subject.enAES
dc.subject.enXPS
dc.title.enTribological behaviour of hard coatings deposited by arc-evaporation PVD
dc.typeArticle de revue
dc.identifier.doi10.1016/S0042-207X(02)00248-8
dc.subject.halChimie/Matériaux
bordeaux.journalVacuum
bordeaux.page559-566
bordeaux.volume67
bordeaux.issue3-4
bordeaux.peerReviewedoui
hal.identifierhal-00817703
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00817703v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Vacuum&rft.date=2002&rft.volume=67&rft.issue=3-4&rft.spage=559-566&rft.epage=559-566&rft.eissn=0042-207X&rft.issn=0042-207X&rft.au=RODR%C3%8DGUEZ,%20R.%20J.&GARC%C3%8DA,%20J.%20A.&MEDRANO,%20A.&RICO,%20M.&S%C3%81NCHEZ,%20R.&rft.genre=article


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