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Low temperature, fast deposition of metallic titanium nitride films using plasma activated reactive evaporation

hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMONTES DE OCA - VALERO, Arturo Javier
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLE PETITCORPS, Yann
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMANAUD, Jean-Pierre
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorCHOLLON, G.
hal.structure.identifierCICATA-Altamira
dc.contributor.authorCARRILLO ROMO, F. J.
hal.structure.identifierCICATA-Altamira
dc.contributor.authorLÓPEZ M., A.
dc.date.issued2005
dc.identifier.issn0734-2101
dc.description.abstractEnTitanium and titanium nitride thin films were deposited on silica glass and W substrates at a high coating growth rate by plasma-activated reactive evaporation (ARE). The crystal structure, preferred orientation and grain size of the coatings were determined by x-ray diffraction (XRD) technique using Cu-Kalpha x rays. The analysis of the coating morphology was performed by field-emission scanning electron microscopy (FE-SEM). The composition of the films was analyzed by Auger electron spectroscopy (AES) and electron-probe microanalysis (EPMA). The titanium and titanium nitride condensates were collected on a carbon-coated collodion film then characterized by transmission electron microscopy (TEM) in order to study the structures of the deposits at very short deposition times. The resistivity of the films was measured by using the four-point-probe method. The titanium coatings were found to consist of very fine particles (40 nm in grain size) and to exhibit a strong (002) texture. The titanium nitride coatings were substoichiometric (TiNx,x<1), with an oxygen content ranging from 7 to 15 at. % depending on the deposition conditions. The deposits were found to exhibit a (111) preferred orientation. This behavior became stronger with coating thickness. In spite of the presence of oxygen, all the TiNx coatings obtained at low temperature and a high growth rate in this work exhibited a rather high electrical conductivity.
dc.language.isoen
dc.publisherAmerican Vacuum Society
dc.subject.enVacuum deposition
dc.subject.enStructure and morphology
dc.subject.enthickness
dc.subject.encrystalline orientation and texture
dc.subject.enPlasma-based ion implantation and deposition
dc.subject.enElectron scattering from surfaces
dc.subject.enMetal and metallic alloys
dc.subject.enTransmission electron microscopy (TEM)
dc.title.enLow temperature, fast deposition of metallic titanium nitride films using plasma activated reactive evaporation
dc.typeArticle de revue
dc.identifier.doi10.1116/1.1874152
dc.subject.halChimie/Matériaux
bordeaux.journalJournal of Vacuum Science & Technology A
bordeaux.page394-400
bordeaux.volume23
bordeaux.issue3
bordeaux.peerReviewedoui
hal.identifierhal-00083959
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00083959v1
bordeaux.COinSctx_ver=Z39.88-2004&amp;rft_val_fmt=info:ofi/fmt:kev:mtx:journal&amp;rft.jtitle=Journal%20of%20Vacuum%20Science%20&%20Technology%20A&amp;rft.date=2005&amp;rft.volume=23&amp;rft.issue=3&amp;rft.spage=394-400&amp;rft.epage=394-400&amp;rft.eissn=0734-2101&amp;rft.issn=0734-2101&amp;rft.au=MONTES%20DE%20OCA%20-%20VALERO,%20Arturo%20Javier&amp;LE%20PETITCORPS,%20Yann&amp;MANAUD,%20Jean-Pierre&amp;CHOLLON,%20G.&amp;CARRILLO%20ROMO,%20F.%20J.&amp;rft.genre=article


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