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dc.rights.licenseopenen_US
dc.contributor.authorTABLATI, A.
dc.contributor.authorALAYLI, N.
dc.contributor.authorARABI, F.
dc.contributor.authorEL BOUBAKARI, K.
dc.contributor.authorYOUSSEF, T.
hal.structure.identifierLaboratoire de l'intégration, du matériau au système [IMS]
dc.contributor.authorTHEOLIER, L.
hal.structure.identifierLaboratoire de l'intégration, du matériau au système [IMS]
dc.contributor.authorWOIRGARD, E.
dc.date.accessioned2022-07-08T08:02:31Z
dc.date.available2022-07-08T08:02:31Z
dc.date.issued2022
dc.date.conference2022-04-25
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/140399
dc.description.abstractEnIn this paper, a study of the influence of an etching on the electric field and the shear stress distribution is presented. A 100 V embedded PCB half-bridge, named VESA1, has been developed and realized by VEDECOM Institute. The study focuses on increasing the breakdown voltage from 100 V to 800 V. The proposed solution is based on the optimization of the copper plate etching in terms of positioning and sizing. A numerical approach using 2D electrical and thermomechanical simulations has shown that aligning the etching on the die and increasing the width of the etches, allow to attenuate the maximum values of the electric field and to reduce the thermomechanical stresses within the assembly. The first steps of the etching process have been performed to validate the manufacturing process.
dc.language.isoENen_US
dc.publisherIEEEen_US
dc.subject.enThermomechanical processes
dc.subject.enMultichip modules
dc.subject.enNumerical simulation
dc.subject.enEtching
dc.subject.enRobustness
dc.subject.enNumerical models
dc.subject.enCopper
dc.title.enIncreased Breakdown Voltage and robustness of Embedded power module
dc.typeCommunication dans un congrès avec actesen_US
dc.identifier.doi10.1109/EuroSimE54907.2022.9758892en_US
dc.subject.halSciences de l'ingénieur [physics]/Micro et nanotechnologies/Microélectroniqueen_US
bordeaux.page1-8en_US
bordeaux.hal.laboratoriesLaboratoire d’Intégration du Matériau au Système (IMS) - UMR 5218en_US
bordeaux.institutionUniversité de Bordeauxen_US
bordeaux.institutionBordeaux INPen_US
bordeaux.institutionCNRSen_US
bordeaux.conference.titleInternational Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE)en_US
bordeaux.countrymten_US
bordeaux.title.proceeding2022 23rd International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE)en_US
bordeaux.conference.citySt Julianen_US
bordeaux.peerReviewedouien_US
bordeaux.import.sourcehal
hal.identifierhal-03665886
hal.version1
hal.exportfalse
workflow.import.sourcehal
dc.rights.ccPas de Licence CCen_US
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.date=2022&rft.spage=1-8&rft.epage=1-8&rft.au=TABLATI,%20A.&ALAYLI,%20N.&ARABI,%20F.&EL%20BOUBAKARI,%20K.&YOUSSEF,%20T.&rft.genre=proceeding


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