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Spontaneous Symmetry Breaking of Nanoscale Spatiotemporal Pattern as the Origin of Helical Nanopore Etching in Silicon

dc.rights.licenseopenen_US
dc.contributor.authorYASUDA, Takumi
dc.contributor.authorMAEDA, Yuki
dc.contributor.authorMATSUZAKI, Kenta
hal.structure.identifierChimie et Biologie des Membranes et des Nanoobjets [CBMN]
dc.contributor.authorOKAZAKI, Yutaka
hal.structure.identifierChimie et Biologie des Membranes et des Nanoobjets [CBMN]
dc.contributor.authorODA, Reiko
dc.contributor.authorKITADA, Atsushi
dc.contributor.authorMURASE, Kuniaki
dc.contributor.authorFUKAMI, Kazuhiro
dc.date.accessioned2020-04-22T07:55:37Z
dc.date.available2020-04-22T07:55:37Z
dc.date.issued2019
dc.identifier.issn1944-8244en_US
dc.identifier.otherhttps://pubs.acs.org/doi/10.1021/acsami.9b18025en_US
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/4328
dc.description.abstractEnNanometric chiral objects such as twisted or helical nanoribbons represent a new class of objects having important potential in a large panel of applications, taking advantage, for example, of electromechanical or optical chirality, local chiral environment for catalysis, and chiral recognition. Supramolecular chemistry has played a central role in the production of such structures through either chiral macromolecules/foldamers or the self-assembly of chiral molecules; the latter can also be used as templates for the sol-gel transcription to silica materials, offering them polymorphisms with further structural stability. Here, we report a totally different and dynamic approach to produce helical mesostructures. This study focuses on helical nanopores that are spontaneously formed in the platinum-assisted chemical etching of silicon by dynamic self-organization under a nonequilibrium state. The symmetry breaking of a helical nanopore formation is achieved by the spatial symmetry breaking of a spatiotemporal pattern at the nanoscale and without incorporation of chiral molecules. Rotational motion of the platinum nanocatalyst, which is regarded as a spatiotemporal pattern at the etching frontier (the platinum/silicon interface), induces precession movement of the nanocatalyst, and movement of the catalyst during etching forms helical nanopores in the silicon. We consider that this study is an important milestone to understand the close relation between spatiotemporal pattern formation and the dynamic emergence of symmetry breaking in chemical reactions.
dc.language.isoENen_US
dc.subject.enmetal-assisted chemical etching
dc.subject.enporous silicon
dc.subject.enhelical nanopore
dc.subject.enspatiotemporal pattern
dc.subject.enself-organization
dc.title.enSpontaneous Symmetry Breaking of Nanoscale Spatiotemporal Pattern as the Origin of Helical Nanopore Etching in Silicon
dc.title.alternativeACS Appl. Mater. Interfacesen_US
dc.typeArticle de revueen_US
dc.identifier.doi10.1021/acsami.9b18025en_US
dc.subject.halChimie/Matériauxen_US
bordeaux.journalACS Applied Materials & Interfacesen_US
bordeaux.page48604-48611en_US
bordeaux.volume11en_US
bordeaux.hal.laboratoriesInstitut de Chimie & de Biologie des Membranes & des Nano-objets (CBMN) - UMR 5248en_US
bordeaux.issue51en_US
bordeaux.institutionBordeaux INPen_US
bordeaux.institutionUniversité de Bordeauxen_US
bordeaux.peerReviewedouien_US
bordeaux.inpressnonen_US
hal.identifierhal-02550311
hal.version1
hal.date.transferred2020-04-22T07:55:43Z
hal.exporttrue
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