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Study of mechanisms involved in photoresist microlens formation

dc.rights.licenseopen
hal.structure.identifierSTMicroelectronics [Crolles] [ST-CROLLES]
hal.structure.identifierLaboratoire d'Ingenierie des Polymères pour les Hautes Technologies
dc.contributor.authorAUDRAN, Stéphanie
hal.structure.identifierSTMicroelectronics [Crolles] [ST-CROLLES]
dc.contributor.authorFAURE, Jean-Baptiste
hal.structure.identifierSTMicroelectronics [Crolles] [ST-CROLLES]
dc.contributor.authorREGOLINI, J.
hal.structure.identifierLaboratoire d'Ingenierie des Polymères pour les Hautes Technologies
dc.contributor.authorSCHLATTER, Guy
hal.structure.identifierLaboratoire d'Ingenierie des Polymères pour les Hautes Technologies
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorHADZIIOANNOU, Georges
dc.date.accessioned2020
dc.date.available2020
dc.date.issued2006
dc.identifier.issn0167-9317
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20609
dc.description.abstractEnThe mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has enabled to demonstrate that there is a competition between surface tensions and resist crosslinking reaction during the final process bake. Depending on the process conditions, the crosslinking reaction kinetics dominate and prevent the correct formation of the microlens.
dc.language.isoen
dc.publisherElsevier
dc.subject.encrosslinking
dc.subject.enrheological properties
dc.subject.enmicrolens
dc.subject.enreflow method
dc.title.enStudy of mechanisms involved in photoresist microlens formation
dc.typeArticle de revue
dc.identifier.doi10.1016/j.mee.2006.01.150
dc.subject.halChimie/Polymères
bordeaux.journalMicroelectronic Engineering
bordeaux.page1087-1090
bordeaux.volume83
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.issue4-9
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
bordeaux.peerReviewedoui
hal.identifierhal-00402979
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00402979v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Microelectronic%20Engineering&rft.date=2006&rft.volume=83&rft.issue=4-9&rft.spage=1087-1090&rft.epage=1087-1090&rft.eissn=0167-9317&rft.issn=0167-9317&rft.au=AUDRAN,%20St%C3%A9phanie&FAURE,%20Jean-Baptiste&REGOLINI,%20J.&SCHLATTER,%20Guy&HADZIIOANNOU,%20Georges&rft.genre=article


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