Mostrar el registro sencillo del ítem

Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

dc.rights.licenseopen
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorCHOCHOS, Christos L.
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorISMAILOVA, Esma
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
dc.contributor.authorBROCHON, Cyril
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorLECLERC, Nicolas
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorTIRON, Raluca
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorSOURD, Claire
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorBANDELIER, Philippe
hal.structure.identifierLithography Laboratory
dc.contributor.authorFOUCHER, Johann
dc.contributor.authorRIDAOUI, Hassan
dc.contributor.authorDIRANI, Ali
hal.structure.identifierDépartement de Photochimie Générale [DPG]
dc.contributor.authorSOPPERA, Olivier
hal.structure.identifierRohm et Haas Electronic Materials
dc.contributor.authorPERRET, Damien
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
hal.structure.identifierRohm et Haas Electronic Materials
dc.contributor.authorBRAULT, Christophe
hal.structure.identifierEcole nationale supérieure de chimie, polymères et materiaux de strasbourg (ECPM)
dc.contributor.authorSERRA, Christophe
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
dc.contributor.authorHADZIIOANNOU, Georges
dc.date.accessioned2020
dc.date.available2020
dc.date.issued2009
dc.identifier.issn0935-9648
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20374
dc.description.abstractEnA chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line-edge roughness (3 sigma) values comparable to those of the reference (commercial) resist.
dc.language.isoen
dc.publisherWiley-VCH Verlag
dc.subject.enAMPLIFICATION
dc.subject.enSCANNING PROBE LITHOGRAPHY
dc.subject.enATOMIC-FORCE MICROSCOPY
dc.subject.enRADICAL POLYMERIZATION
dc.subject.enRAFT POLYMERIZATION
dc.subject.enNM LITHOGRAPHY
dc.subject.enEND-GROUPS
dc.subject.enMICROLITHOGRAPHY
dc.subject.enPHOTORESISTS
dc.subject.enCOPOLYMERS
dc.title.enHyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
dc.typeArticle de revue
dc.identifier.doi10.1002/adma.200801715
dc.subject.halChimie/Polymères
bordeaux.journalAdvanced Materials
bordeaux.page1121-1125
bordeaux.volume21
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.issue10-11
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
bordeaux.peerReviewedoui
hal.identifierhal-00945178
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00945178v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Advanced%20Materials&rft.date=2009&rft.volume=21&rft.issue=10-11&rft.spage=1121-1125&rft.epage=1121-1125&rft.eissn=0935-9648&rft.issn=0935-9648&rft.au=CHOCHOS,%20Christos%20L.&ISMAILOVA,%20Esma&BROCHON,%20Cyril&LECLERC,%20Nicolas&TIRON,%20Raluca&rft.genre=article


Archivos en el ítem

ArchivosTamañoFormatoVer

No hay archivos asociados a este ítem.

Este ítem aparece en la(s) siguiente(s) colección(ones)

Mostrar el registro sencillo del ítem