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Design of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes

dc.rights.licenseopen
hal.structure.identifierGroupement de recherches de Lacq [GRL]
dc.contributor.authorCHEVALIER, Xavier
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
dc.contributor.authorCOUPILLAUD, Paul
hal.structure.identifierGroupement de recherches de Lacq [GRL]
dc.contributor.authorLOMBARD, Geoffrey
hal.structure.identifierGroupement de recherches de Lacq [GRL]
dc.contributor.authorNICOLET, Célia
hal.structure.identifierGroupement de recherches de Lacq [GRL]
dc.contributor.authorBEAUSOLEIL, Julien
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorFLEURY, Guillaume
dc.contributor.authorZELSMANN, Marc
dc.contributor.authorBÉZARD, Philippe
dc.contributor.authorCUNGE, Gilles
hal.structure.identifierBREWER Sci Inc, Rolla, MO 65401 USA
dc.contributor.authorBERRON, John
hal.structure.identifierBREWER Sci Inc, Rolla, MO 65401 USA
dc.contributor.authorSAKAVUYI, Kaumba
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorGHARBI, Ahmed
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorTIRON, Raluca
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
dc.contributor.authorHADZIIOANNOU, Georges
hal.structure.identifierGroupement de recherches de Lacq [GRL]
dc.contributor.authorNAVARRO, Christophe
hal.structure.identifierARKEMA FRANCE, Rue Estienne Orves, Colombes
dc.contributor.authorCAYREFOURCQ, Ian
dc.date.accessioned2020
dc.date.available2020
dc.date.created2016
dc.date.issued2016
dc.identifier.isbnISBN:978-1-5106-0014-0
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20168
dc.description.abstractEnProperties of new block copolymers systems, specifically designed to reach large periods for the features, are compared to the ones exhibited by classical PS-b-PMMA materials of same dimensions. Conducted studies, like free-surface defects analysis, mild-plasma tomography experiments, graphoepitaxy-guided structures, etch-transfer. indicate much better performances, in terms of achievable film-thicknesses with perpendicular features, defects levels, and dimensional uniformities, for the new system than for the classical PS-b-PMMA. These results clearly highlight unique and original solutions toward an early introduction of DSA technology into large lithographic nodes.
dc.language.isoen
dc.source.titleADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII
dc.subject.enORIENTATION
dc.title.enDesign of new block-copolymer systems to achieve thick-films with defect-free structures for applications of DSA into lithographic large nodes
dc.typeChapitre d'ouvrage
dc.identifier.doi10.1117/12.2219214
dc.subject.halChimie/Polymères
bordeaux.pageArt. No. 977913
bordeaux.volume9779
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
hal.identifierhal-01406087
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01406087v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.btitle=ADVANCES%20IN%20PATTERNING%20MATERIALS%20AND%20PROCESSES%20XXXIII&rft.date=2016&rft.volume=9779&rft.spage=Art.%20No.%20977913&rft.epage=Art.%20No.%20977913&rft.au=CHEVALIER,%20Xavier&COUPILLAUD,%20Paul&LOMBARD,%20Geoffrey&NICOLET,%20C%C3%A9lia&BEAUSOLEIL,%20Julien&rft.isbn=ISBN:978-1-5106-0014-0&rft.genre=unknown


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