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Transient stages in the chemical vapor deposition of silicon carbide

dc.rights.licenseopenen_US
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorCHOLLON, Georges
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorLANGLAIS, Francis
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorPLACIDE, Maud
dc.date.accessioned2023-10-25T09:42:18Z
dc.date.available2023-10-25T09:42:18Z
dc.date.issued2011-09-01
dc.identifier.issn1533-4880en_US
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/184534
dc.description.abstractEnTransient CVD experiments were simulated by varying continuously the deposition temperature or the initial gas flow rates (Q(MTS) or Q(H2)). Their consequences on the physicochemical properties of the coatings have been first examined. The adhesion of SiC/SiC bilayers containing these "transient interphases" (phi(Tr)) was investigated by scratch testing. For transient stages resulting from a decrease of Q(MTS) or T, free silicon can be co-deposited in proportions depending on alpha = Q(H2)/Q(MTS), T and P. This phenomenon is related to the high reactivity of the Si bearing species and is activated by high T and P and low a values. In this case, the continuous covalent bonding through the Si-rich interphases preserves the adhesion between the two SiC layers. Transient stages resulting from a decrease of Q(H2) lead first to larger and columnar SiC grains and finally to the deposition of anisotropic carbon, due to the formation of unsaturated hydrocarbons in the gas phase. The interphases with the highest carbon concentrations and thicknesses lead to delamination and local chipping of the outer SiC layer. The poor shear strength of these continuous and anisotropic layers is detrimental to the adherence of the bilayers.
dc.language.isoENen_US
dc.title.enTransient stages in the chemical vapor deposition of silicon carbide
dc.title.alternativeJ Nanosci Nanotechnolen_US
dc.typeArticle de revueen_US
dc.identifier.doi10.1166/jnn.2011.5030en_US
dc.subject.halSciences de l'ingénieur [physics]/Matériauxen_US
dc.subject.halChimie/Matériauxen_US
dc.identifier.pubmed22097579en_US
bordeaux.journalJournal of Nanoscience and Nanotechnologyen_US
bordeaux.page8333-8336en_US
bordeaux.volume11en_US
bordeaux.hal.laboratoriesLaboratoire des Composites Thermo Structuraux (LCTS) - UMR 5801en_US
bordeaux.issue9en_US
bordeaux.institutionUniversité de Bordeauxen_US
bordeaux.institutionCNRSen_US
bordeaux.institutionCEAen_US
bordeaux.peerReviewedouien_US
bordeaux.inpressnonen_US
bordeaux.import.sourcepubmed
hal.popularnonen_US
hal.audienceInternationaleen_US
hal.exportfalse
workflow.import.sourcepubmed
dc.rights.ccPas de Licence CCen_US
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