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hal.structure.identifierCentre de physique moléculaire optique et hertzienne [CPMOH]
dc.contributor.authorEZZAHRI, Y.
hal.structure.identifierCentre de physique moléculaire optique et hertzienne [CPMOH]
dc.contributor.authorDILHAIRE, S.
hal.structure.identifierCentre de physique moléculaire optique et hertzienne [CPMOH]
dc.contributor.authorGRAUBY, Stéphane
hal.structure.identifierCentre de physique moléculaire optique et hertzienne [CPMOH]
dc.contributor.authorPATINO-LOPEZ, L. D.
hal.structure.identifierCentre de physique moléculaire optique et hertzienne [CPMOH]
dc.contributor.authorCLAEYS, W.
dc.contributor.authorZHANG, Y.
dc.contributor.authorBIAN, Z.
dc.contributor.authorSHAKOURI, A.
dc.date.issued2005
dc.date.conference2005-06-19
dc.description.abstractEnA new method based on thermal quadrupoles is presented to model the behavior of a single stage Si/SiGe micro-cooler in AC operating regime. The cold side temperature is calculated for different excitation frequencies, current magnitudes and device sizes. The sensitivity and precision of this method come from its analytical expressions, which are based on the solution of the Fourier heat equation in Laplace space. We assume that the thermal properties of the device are temperature independent. Action of each layer is represented by a matrix which relates the temperature-flux vectors at both sides in the frequency domain. A comparison of the model with experimental reflectometry techniques is also presented. Performance of Si/SiGe micro-coolers can be optimized by a combination of optical characterization techniques and the thermal quadrupoles simulation.
dc.language.isoen
dc.publisherIeee
dc.source.titleICT 2005. 24th International Conference on Thermoelectrics, 2005.
dc.subject.enSilicon germanium
dc.subject.enGermanium silicon alloys
dc.subject.enThermoelectricity
dc.subject.enSuperlattices
dc.subject.enTemperature
dc.subject.enDoping
dc.subject.enFrequency
dc.subject.enMicroelectronics
dc.subject.enSemiconductor films
dc.subject.enSubstrates
dc.title.enSimulation of Si/SiGe micro-cooler by thermal quadrupoles method
dc.typeCommunication dans un congrès
dc.identifier.doi10.1109/ICT.2005.1519932
dc.subject.halPhysique [physics]
bordeaux.page241-245
bordeaux.countryUS
bordeaux.title.proceedingICT 2005. 24th International Conference on Thermoelectrics, 2005.
bordeaux.conference.cityClemson, SC
bordeaux.peerReviewednon
hal.identifierhal-01552747
hal.version1
hal.invitednon
hal.proceedingsoui
hal.conference.end2005-06-23
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01552747v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.btitle=ICT%202005.%2024th%20International%20Conference%20on%20Thermoelectrics,%202005.&rft.date=2005&rft.spage=241-245&rft.epage=241-245&rft.au=EZZAHRI,%20Y.&DILHAIRE,%20S.&GRAUBY,%20St%C3%A9phane&PATINO-LOPEZ,%20L.%20D.&CLAEYS,%20W.&rft.genre=unknown


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