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Influence of Substrate Temperature and Film Thickness on Thermal, Electrical, and Structural Properties of HPPMS and DC Magnetron Sputtered Ge Thin Films 

hal.structure.identifierInstitute for Materials
dc.contributor.authorFURLAN, Andrej
hal.structure.identifierInstitute for Materials
dc.contributor.authorGROCHLA, Dario
hal.structure.identifierLaboratoire Ondes et Matière d'Aquitaine [LOMA]
hal.structure.identifierAmplitude Systèmes
dc.contributor.authorD'ACREMONT, Quentin
hal.structure.identifierLaboratoire d'Energétique et Mécanique Théorique et Appliquée [LEMTA ]
dc.contributor.authorPERNOT, Gilles
hal.structure.identifierLaboratoire Ondes et Matière d'Aquitaine [LOMA]
dc.contributor.authorDILHAIRE, Stefan
hal.structure.identifierInstitute for Materials
dc.contributor.authorLUDWIG, Alfred
dc.date.created2016-12-20
dc.date.issued2017
dc.identifier.issn1438-1656
dc.description.abstractEnGe was deposited as thickness gradient films at temperatures up to 800C by direct current (DC) and high power pulsed magnetron sputtering (HPPMS). Structural characterization shows increased crystallization with increasing substrate temperature and film thickness. Thermal conductivity was measured by a novel high-throughput time-domain thermo-reflectance method. Thermo-electrical properties correlate to the degree of crystallization. Conductivities increase with increasing substrate temperature up to 500C. For higher temperatures the trend reverses. A room temperature deposited/ annealed film displays smaller crystallites (10 nm) and lower thermal conductivity (5Wm-1 K-1) compared to 25Wm-1K-1 for hot DC deposition. Compared to DC, HPPMS films show higher thermal conductivities up to 45Wm-1K-1.
dc.language.isoen
dc.publisherWiley-VCH Verlag
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/
dc.subject.enGermanium
dc.subject.enThin Films
dc.subject.enThermal Properties
dc.subject.enElectrical Properties
dc.subject.enDC Magnetron
dc.title.enInfluence of Substrate Temperature and Film Thickness on Thermal, Electrical, and Structural Properties of HPPMS and DC Magnetron Sputtered Ge Thin Films 
dc.typeArticle de revue
dc.identifier.doi10.1002/adem.201600854
dc.subject.halPhysique [physics]/Matière Condensée [cond-mat]/Science des matériaux [cond-mat.mtrl-sci]
bordeaux.journalAdvanced Engineering Materials
bordeaux.page1600854
bordeaux.volume19
bordeaux.issue5
bordeaux.peerReviewedoui
hal.identifierhal-01539190
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01539190v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Advanced%20Engineering%20Materials&rft.date=2017&rft.volume=19&rft.issue=5&rft.spage=1600854&rft.epage=1600854&rft.eissn=1438-1656&rft.issn=1438-1656&rft.au=FURLAN,%20Andrej&GROCHLA,%20Dario&D'ACREMONT,%20Quentin&PERNOT,%20Gilles&DILHAIRE,%20Stefan&rft.genre=article


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