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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorBODEUX, Romain
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMICHAU, Dominique
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorJOSSE, Michaël
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMAGLIONE, Mario
dc.date.issued2014
dc.identifier.issn1293-2558
dc.description.abstractEnTetragonal tungsten bronze (TTB) films have been synthesised on Pt(111)/TiO2/SiO2/Si substrates from Ba2LnFeNb4O15 ceramics (Ln = La, Nd, Eu) by RF magnetron sputtering. X-ray diffraction measurements evidenced the multi-oriented nature of films with some degrees of preferential orientation along (111). The dependence of the dielectric properties on temperature and frequency has been investigated. The dielectric properties of the films are similar to those of the bulk, i.e., ε ∼150 and σ ∼10−6 Ω−1 cm−1 at 1 MHz and room temperature. The films exhibit two dielectric anomalies which are attributed to Maxwell Wagner polarization mechanism and relaxor behaviour. Both anomalies are sensitive to post-annealing under oxygen atmosphere and their activation energies are similar Ea ∼0.30 eV. They are explained in terms of electrically heterogeneous contributions in the films.
dc.description.sponsorshipCroissance Cristalline d'Oxydes Dielectriques - ANR-09-JCJC-0079
dc.language.isoen
dc.publisherElsevier
dc.subject.enTTB
dc.subject.enPVD
dc.subject.enSemiconductor oxide
dc.subject.enInterfaces
dc.subject.enSchottky barrier
dc.subject.enFerroelectric
dc.title.enDielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering
dc.typeArticle de revue
dc.identifier.doi10.1016/j.solidstatesciences.2014.10.007
dc.subject.halChimie/Matériaux
bordeaux.journalSolid State Sciences
bordeaux.page112-118
bordeaux.volume38
bordeaux.peerReviewedoui
hal.identifierhal-01078544
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01078544v1
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