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hal.structure.identifierDepartment of Materials [ETH Zürich] [D-MATL]
dc.contributor.authorSCHAAB, Jakob
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorCANO, Andrés
hal.structure.identifierDepartment of Materials [ETH Zürich] [D-MATL]
dc.contributor.authorLILIENBLUM, Martin
hal.structure.identifierMaterials Science Division [LBNL Berkeley]
dc.contributor.authorYAN, Zewu
hal.structure.identifierMaterials Science Division [LBNL Berkeley]
dc.contributor.authorBOURRET, Edith
hal.structure.identifierDepartment of Materials [ETH Zürich] [D-MATL]
dc.contributor.authorMEIER, Dennis
dc.contributor.authorRAMESH, Ramamoorthy
hal.structure.identifierDepartment of Materials [ETH Zürich] [D-MATL]
dc.contributor.authorFIEBIG, Manfred
dc.date.issued2016
dc.description.abstractEnElectronic domain-wall conductance is controlled by chemical aliovalent doping in the p-type semiconductor Er1-xCaxMnO3. Coexisting bound (top panel) and mobile (lower panel) charges at the walls are analyzed using electrostatic force micro­scopy. Emergent doping-related variations are quantified by local transport measurements and explained based on phenomenological theories.
dc.language.isoen
dc.publisherWiley
dc.title.enOptimization of electronic domain-wall properties by aliovalent cation substitution
dc.typeArticle de revue
dc.identifier.doi10.1002/aelm.201500195
dc.subject.halChimie/Matériaux
bordeaux.journalAdvanced Electronic Materials
bordeaux.page1500195 (5 p.)
bordeaux.volume2
bordeaux.issue1
bordeaux.peerReviewedoui
hal.identifierhal-01316749
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01316749v1
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