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hal.structure.identifierLaboratoire de Chimie théorique et Physico-chimie moléculaire [LCTPCM]
dc.contributor.authorMARTINEZ, Hervé
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorBENAYAD, Anas
hal.structure.identifierLaboratoire de Chimie théorique et Physico-chimie moléculaire [LCTPCM]
dc.contributor.authorGONBEAU, Danielle
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorVINATIER, Philippe
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPECQUENARD, Brigitte
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLEVASSEUR, Alain
dc.date.issued2004
dc.identifier.issn0169-4332
dc.language.isoen
dc.publisherElsevier
dc.subject.enTungsten oxysulfide
dc.subject.enTitanium oxysulfide
dc.subject.enThin films
dc.subject.enXPS
dc.subject.enCore peaks
dc.subject.enValence bands
dc.subject.enDensity of states
dc.title.enInfluence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS
dc.typeArticle de revue
dc.identifier.doi10.1016/j.apsusc.2004.05.010
dc.subject.halChimie/Matériaux
bordeaux.journalApplied Surface Science
bordeaux.page377-386
bordeaux.volume236
bordeaux.issue1-4
bordeaux.peerReviewedoui
hal.identifierhal-00150342
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00150342v1
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