Influence of the cation nature of high sulfur content oxysulfide thin films MOySz (M=W, Ti) studied by XPS
Language
en
Article de revue
This item was published in
Applied Surface Science. 2004, vol. 236, n° 1-4, p. 377-386
Elsevier
English Keywords
Tungsten oxysulfide
Titanium oxysulfide
Thin films
XPS
Core peaks
Valence bands
Density of states
Origin
Hal imported