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Characterization of the polishing-induced contamination of fused silica optics

hal.structure.identifierCommissariat à l'Energie Atomique et aux Energies Alternatives [CEA-CESTA]
dc.contributor.authorNEAUPORT, Jérôme
hal.structure.identifierCommissariat à l'Energie Atomique et aux Energies Alternatives [CEA-CESTA]
dc.contributor.authorPFIFFER, Mathilde
hal.structure.identifierCEA Le Ripault [CEA Le Ripault]
dc.contributor.authorLONGUET, Jean-Louis
hal.structure.identifierPlateforme Aquitaine de Caractérisation des Matériaux [PLACAMAT]
dc.contributor.authorLABRUGÈRE, Christine
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorFARGIN, Evelyne
hal.structure.identifierCentre d'Etudes Lasers Intenses et Applications [CELIA]
dc.contributor.authorBOUSQUET, Bruno
hal.structure.identifierInstitut des Sciences Moléculaires [ISM]
dc.contributor.authorDUSSAUZE, Marc
hal.structure.identifierCEA Le Ripault [CEA Le Ripault]
dc.contributor.authorLAMBERT, Sebastien
hal.structure.identifierCommissariat à l'Energie Atomique et aux Energies Alternatives [CEA-CESTA]
dc.contributor.authorCORMONT, Philippe
dc.date.created2011-02
dc.date.issued2017
dc.identifier.issn0002-7820
dc.description.abstractEnIn this work, the polishing-induced contamination layer at the fused silica optics surface was studied with various interface analysis techniques: Secondary Ion Mass Spectroscopy (SIMS), Electron Probe Microanalysis (EPMA), X-Ray Photoelectron Spectroscopy (XPS), and Inductively Coupled Plasma—Optical Emission Spectroscopy (ICP-OES). Samples were prepared using an MRF polishing machine and cerium-based slurry. The cerium and iron penetration and concentration were measured in the surface out of defects. Cerium is embedded at the surface in a 60 nm layer and concentrated at 1200 ppmw in this layer while iron concentration falls down at 30 nm. Spatial distribution and homogeneity of the pollution were also studied in the scratches and bevel using SIMS and EPMA techniques. We saw evidence that surface defects, such as scratches, are specific places that hold the pollutants. This overconcentration is also observed in the chamfer. These new insights into the polishing-induced contamination of fused silica optics and it repartition have been obtained using various characterization methods. Advantages and disadvantages of each one are discussed.
dc.description.sponsorshipInitiative d'excellence de l'Université de Bordeaux - ANR-10-IDEX-0003
dc.language.isoen
dc.publisherWiley
dc.title.enCharacterization of the polishing-induced contamination of fused silica optics
dc.typeArticle de revue
dc.identifier.doi10.1111/jace.14448
dc.subject.halPhysique [physics]/Physique [physics]/Optique [physics.optics]
dc.subject.halChimie/Matériaux
bordeaux.journalJournal of the American Ceramic Society
bordeaux.page96-107
bordeaux.volume100
bordeaux.issue1
bordeaux.peerReviewedoui
hal.identifiercea-01622307
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//cea-01622307v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal%20of%20the%20American%20Ceramic%20Society&rft.date=2017&rft.volume=100&rft.issue=1&rft.spage=96-107&rft.epage=96-107&rft.eissn=0002-7820&rft.issn=0002-7820&rft.au=NEAUPORT,%20J%C3%A9r%C3%B4me&PFIFFER,%20Mathilde&LONGUET,%20Jean-Louis&LABRUG%C3%88RE,%20Christine&FARGIN,%20Evelyne&rft.genre=article


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