A comparative study of CrN, ZrN, NbN and TaN layers as cobalt diffusion barriers for CVD diamond deposition on WC–Co tools
Idioma
en
Article de revue
Este ítem está publicado en
Surface and Coatings Technology. 2007, vol. 202, n° 2, p. 222-231
Elsevier
Resumen en inglés
Chromium, zirconium, niobium and tantalum nitrides layers have been sputtered onto WC–12 wt.% Co substrates as diffusion barriers and buffer layers for improving performances of diamond surface coating. X-ray diffraction ...Leer más >
Chromium, zirconium, niobium and tantalum nitrides layers have been sputtered onto WC–12 wt.% Co substrates as diffusion barriers and buffer layers for improving performances of diamond surface coating. X-ray diffraction shows under specific reactive sputtering conditions, only MN (M = Cr, Zr, Nb, Ta) type phase exits. Their electric resistivity has been measured on samples deposited onto silica under the same conditions and related to those published. Surface and transverse scanning electron microscopy shows a dense columnar morphology...< Leer menos
Palabras clave en inglés
Diamond surface coating
Transition and refractory metal nitride thin films
Diffusion barriers
Nitride layers thermo chemical stability
Nitride layers carburization
Cobalt diffusion
Orígen
Importado de HalCentros de investigación