A comparative study of CrN, ZrN, NbN and TaN layers as cobalt diffusion barriers for CVD diamond deposition on WC–Co tools
Language
en
Article de revue
This item was published in
Surface and Coatings Technology. 2007, vol. 202, n° 2, p. 222-231
Elsevier
English Abstract
Chromium, zirconium, niobium and tantalum nitrides layers have been sputtered onto WC–12 wt.% Co substrates as diffusion barriers and buffer layers for improving performances of diamond surface coating. X-ray diffraction ...Read more >
Chromium, zirconium, niobium and tantalum nitrides layers have been sputtered onto WC–12 wt.% Co substrates as diffusion barriers and buffer layers for improving performances of diamond surface coating. X-ray diffraction shows under specific reactive sputtering conditions, only MN (M = Cr, Zr, Nb, Ta) type phase exits. Their electric resistivity has been measured on samples deposited onto silica under the same conditions and related to those published. Surface and transverse scanning electron microscopy shows a dense columnar morphology...Read less <
English Keywords
Diamond surface coating
Transition and refractory metal nitride thin films
Diffusion barriers
Nitride layers thermo chemical stability
Nitride layers carburization
Cobalt diffusion
Origin
Hal imported