Afficher la notice abrégée

hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorHODROJ, Abbas
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorTEULÉ-GAY, Lionel
hal.structure.identifierPlateforme Aquitaine de Caractérisation des Matériaux [PLACAMAT]
dc.contributor.authorLAHAYE, Michel
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMANAUD, Jean-Pierre
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPOULON-QUINTIN, Angeline
dc.date.issued2018
dc.identifier.issn2372-0484
dc.description.abstractEnNanocrystalline diamond NCD coatings could improve the performances of cutting tools if the adhesion on cobalt-cemented tungsten carbide WC–Co substrates was optimized and maintained during diamond deposit. In this study, a time modulated polarized growth process during diamond hot filament chemical vapor deposition (HFCVD) method was used. NCD coatings were deposited on cobalt-cemented tungsten carbide (WC–10% Co) substrates previously coated with tantalum or zirconium nitride–molybdenum bilayer as interlayer systems to control carbon and cobalt diffusion. Continuous films consisted of diamond clusters. Their size decreased when the applied bias voltage increased and substrate temperature decreased. Raman analyses confirmed the reduction of crystallite size and formation of nanocrystalline diamond films by time modulated biased substrate HFCVD process. Scratch tests showed that the NCD/interlayer systems/WC–10% Co displayed very good film adhesion interesting for cutting tools applications compared to NCD/WC–10% Co. In addition using an interlayer system could offer additional protection when diamond coating was deteriorated. This technique seems to be promising for industrial applications in the field of machining tools when increasing the thickness of the diamond layer by only extending the time modulated deposition process.
dc.language.isoen
dc.publisherAIMS Press
dc.subject.enNCD
dc.subject.enHFCVD
dc.subject.entime modulated polarized growth
dc.subject.enRaman
dc.subject.enAES
dc.subject.enadhesion
dc.title.enNanocrystalline diamond coatings: Effects of time modulation bias enhanced HFCVD parameters
dc.typeArticle de revue
dc.identifier.doi10.3934/matersci.2018.3.519
dc.subject.halChimie/Matériaux
bordeaux.journalAIMS Materials Science
bordeaux.page519-532
bordeaux.volume5
bordeaux.issue3
bordeaux.peerReviewedoui
hal.identifierhal-01916713
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-01916713v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=AIMS%20Materials%20Science&rft.date=2018&rft.volume=5&rft.issue=3&rft.spage=519-532&rft.epage=519-532&rft.eissn=2372-0484&rft.issn=2372-0484&rft.au=HODROJ,%20Abbas&TEUL%C3%89-GAY,%20Lionel&LAHAYE,%20Michel&MANAUD,%20Jean-Pierre&POULON-QUINTIN,%20Angeline&rft.genre=article


Fichier(s) constituant ce document

FichiersTailleFormatVue

Il n'y a pas de fichiers associés à ce document.

Ce document figure dans la(les) collection(s) suivante(s)

Afficher la notice abrégée