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hal.structure.identifierLaboratoire d'Etude des Matériaux en Milieux Agressifs [LEMMA]
dc.contributor.authorGROSSEAU-POUSSARD, Jean-Luc
hal.structure.identifierLaboratoire d'Etude des Matériaux en Milieux Agressifs [LEMMA]
dc.contributor.authorPANICAUD, Benoît
hal.structure.identifierLaboratoire d'Etude des Matériaux en Milieux Agressifs [LEMMA]
dc.contributor.authorPEDRAZA, F.
hal.structure.identifierLaboratoire de métallurgie physique [LMP [Poitiers]]
dc.contributor.authorRENAULT, P. O.
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorSILVAIN, Jean-François
dc.date.issued2003
dc.identifier.issn0021-8979
dc.description.abstractEnIron phosphate thin films have been obtained under controlled conditions by chemical conversion deposition. The films were formed on polycrystalline α-iron by immersion in acetone, as an organic solvent. After deposition, the films were investigated by x-ray photoelectron spectroscopy (XPS) and their influence on the thermal oxidation of α-iron was studied by means of in situ low incidence x-ray diffraction of synchrotron radiation. The study reveals interesting features related to the structure of both the phosphate and thermal oxide films. The XPS data suggest the iron phosphate to be constituted of long chains of phosphate groups PO<sup>3-</sup><sub>4</sub> these groups being interconnected by Fe<sup>2+</sup>and Fe<sup>3+</sup> cations. X-ray diffraction measurements have shown a significant modification of the oxidation behavior of α-iron at 400 °C and atmospheric pressure, which is derived from the presence of the thin film: α- Fe<sub>2</sub>&nbsp;O<sub>3</sub> formation is clearly enhanced to the detriment of Fe<sub>3</sub>&nbsp;O<sub>4</sub> compared to the oxidation of pure iron in which Fe<sub>3</sub>&nbsp;O<sub>4</sub> is the dominant phase. As the growth rate of the α- Fe<sub>2</sub> O<sub>3</sub> layer is significantly reduced compared to that of Fe<sub>3</sub>&nbsp;O<sub>4</sub> thus the phosphated layers may find niche applications in low-to-moderate temperature environments.
dc.language.isoen
dc.publisherAmerican Institute of Physics
dc.subject.enPhosphate
dc.subject.enIron
dc.subject.enOxidation
dc.subject.enThin films
dc.subject.enMicrofabrication
dc.subject.enPolycrystalline material
dc.subject.enX-ray diffraction
dc.subject.enX-ray photoelectron spectroscopy
dc.subject.enSynchrotron radiation
dc.subject.enTransition metals
dc.subject.enPhosphates
dc.title.enIron oxidation under the influence of phosphate thin films
dc.typeArticle de revue
dc.identifier.doi10.1063/1.1579126
dc.subject.halChimie/Matériaux
bordeaux.journalJournal of Applied Physics
bordeaux.page784-788
bordeaux.volume94
bordeaux.issue1
bordeaux.peerReviewedoui
hal.identifierhal-00211285
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00211285v1
bordeaux.COinSctx_ver=Z39.88-2004&amp;rft_val_fmt=info:ofi/fmt:kev:mtx:journal&amp;rft.jtitle=Journal%20of%20Applied%20Physics&amp;rft.date=2003&amp;rft.volume=94&amp;rft.issue=1&amp;rft.spage=784-788&amp;rft.epage=784-788&amp;rft.eissn=0021-8979&amp;rft.issn=0021-8979&amp;rft.au=GROSSEAU-POUSSARD,%20Jean-Luc&amp;PANICAUD,%20Beno%C3%AEt&amp;PEDRAZA,%20F.&amp;RENAULT,%20P.%20O.&amp;SILVAIN,%20Jean-Fran%C3%A7ois&amp;rft.genre=article


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