GROSSEAU-POUSSARD, Jean-Luc; PANICAUD, Benoît; PEDRAZA, F.; RENAULT, P. O.; SILVAIN, Jean-François

doi:10.1063/1.1579126

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GROSSEAU-POUSSARD, Jean-Luc
Laboratoire d'Etude des Matériaux en Milieux Agressifs [LEMMA]

PANICAUD, Benoît
Laboratoire d'Etude des Matériaux en Milieux Agressifs [LEMMA]

PEDRAZA, F.
Laboratoire d'Etude des Matériaux en Milieux Agressifs [LEMMA]

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Ce document a été publié dans

Journal of Applied Physics. 2003, vol. 94, n° 1, p. 784-788

American Institute of Physics

Résumé en anglais

Iron phosphate thin films have been obtained under controlled conditions by chemical conversion deposition. The films were formed on polycrystalline α-iron by immersion in acetone, as an organic solvent. After deposition, the films were investigated by x-ray photoelectron spectroscopy (XPS) and their influence on the thermal oxidation of α-iron was studied by means of in situ low incidence x-ray diffraction of synchrotron radiation. The study reveals interesting features related to the structure of both the phosphate and thermal oxide films. The XPS data suggest the iron phosphate to be constituted of long chains of phosphate groups PO3-4 these groups being interconnected by Fe2+and Fe3+ cations. X-ray diffraction measurements have shown a significant modification of the oxidation behavior of α-iron at 400 °C and atmospheric pressure, which is derived from the presence of the thin film: α- Fe2 O3 formation is clearly enhanced to the detriment of Fe3 O4 compared to the oxidation of pure iron in which Fe3 O4 is the dominant phase. As the growth rate of the α- Fe2 O3 layer is significantly reduced compared to that of Fe3 O4 thus the phosphated layers may find niche applications in low-to-moderate temperature environments.< Réduire

Mots clés en anglais

Phosphate

Iron

Oxidation

Thin films

Microfabrication

Polycrystalline material

X-ray diffraction

X-ray photoelectron spectroscopy

Synchrotron radiation

Transition metals

Phosphates

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Iron oxidation under the influence of phosphate thin films

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