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hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorBIEN-AIMÉ, Karell
hal.structure.identifierInstitut des Sciences Moléculaires [ISM]
dc.contributor.authorBELIN, C.
hal.structure.identifierInstitut FRESNEL [FRESNEL]
dc.contributor.authorGALLAIS, Laurent
hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorGRUA, Pierre
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorFARGIN, E.
hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorNÉAUPORT, Jérôme
hal.structure.identifierCentre d'études scientifiques et techniques d'Aquitaine [CESTA]
dc.contributor.authorTOVENA-PECAULT, Isabelle
dc.date.accessioned2022-10-12T08:25:38Z
dc.date.available2022-10-12T08:25:38Z
dc.date.issued2009
dc.identifier.issn1094-4087
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/149689
dc.description.abstractEnThe impact of storage conditions on laser induced damage density at 351 nm on bare fused polished silica samples has been studied. Intentionally outgassing of polypropylene pieces on silica samples was done. We evidenced an important increase of laser induced damage density on contaminated samples demonstrating that storage could limit optics lifetime performances. Atomic Force Microscopy (AFM) and Gas Chromatography -Mass Spectrometry (GC-MS) have been used to identify the potential causes of this effect. It shows that a small quantity of organic contamination deposited on silica surface is responsible for this degradation. Various hypotheses are proposed to explain the damage mechanism. The more likely hypothesis is a coupling between surface defects of optics and organic contaminants.
dc.language.isoen
dc.publisherOptical Society of America - OSA Publishing
dc.title.enImpact of storage induced outgassing organic contamination on laser induced damage of silica optics at 351 nm
dc.typeArticle de revue
dc.identifier.doi10.1364/OE.17.018703
dc.subject.halPhysique [physics]/Physique [physics]/Optique [physics.optics]
bordeaux.journalOptics Express
bordeaux.page18703-18713
bordeaux.volume17
bordeaux.hal.laboratoriesInstitut de Chimie de la Matière Condensée de Bordeaux (ICMCB) - UMR 5026*
bordeaux.issue21
bordeaux.institutionUniversité de Bordeaux
bordeaux.institutionBordeaux INP
bordeaux.institutionCNRS
bordeaux.peerReviewedoui
hal.identifierhal-00424447
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00424447v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Optics%20Express&rft.date=2009&rft.volume=17&rft.issue=21&rft.spage=18703-18713&rft.epage=18703-18713&rft.eissn=1094-4087&rft.issn=1094-4087&rft.au=BIEN-AIM%C3%89,%20Karell&BELIN,%20C.&GALLAIS,%20Laurent&GRUA,%20Pierre&FARGIN,%20E.&rft.genre=article


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